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[미국특허] Laser produced plasma EUV light source 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H04H-001/04
출원번호 US-0655987 (2010-01-11)
등록번호 US8035092 (2011-09-27)
발명자 / 주소
  • Bykanov, Alexander N.
  • Bowering, Norbert
  • Fomenkov, Igor V.
  • Ershov, Alexander I.
  • Khodykin, Oleh
출원인 / 주소
  • Cymer, Inc.
인용정보 피인용 횟수 : 5  인용 특허 : 106

초록 ▼

A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the p

대표청구항 ▼

What is claimed is: 1. An apparatus comprising:a target material;a Q-switched oscillator generating at least one output light pulse, said output pulse having a leading edge and a trailing edge; anda trimming system for trimming at least one of said leading and trailing edges to produce a trimmed pul

이 특허에 인용된 특허 (106) 인용/피인용 타임라인 분석

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이 특허를 인용한 특허 (5) 인용/피인용 타임라인 분석

  1. Ershov, Alexander I.; Fomenkov, Igor V., Laser-produced-plasma EUV light source.
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  2. Kuritsyn, Alexey; Liu, Ye; Khodykin, Oleg, Plasma based light source having a target material coated on a cylindrically-symmetric element.
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  3. Flock, Klaus, Pulsed laser induced plasma light source.
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  4. Fleurov, Vladimir B.; Partlo, William N.; Fomenkov, Igor V.; Ershov, Alexander I., Systems and methods for buffer gas flow stabilization in a laser produced plasma light source.
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  5. Partlo, William N.; Fomenkov, Igor V.; Paxton, Jason, Systems and methods for drive laser beam delivery in an EUV light source.
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