이 특허에 인용된 특허 (23) 인용/피인용 타임라인 분석

1. Scherrer Raymond E. (West Palm Beach FL), Apparatus for lapping or polishing materials.

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2. Hashimoto Hiromasa,JPX ; Kasai Kenji,JPX ; Ichikawa Taichi,JPX ; Kawaura Yuji,JPX, Backing pad and method for polishing semiconductor wafer therewith.

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3. O'Moore, Fergal; Schultz, Steve; Severson, Brian, CMP apparatuses with polishing assemblies that provide for the passive removal of slurry.

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4. Bottema, Brian E.; Bustos, Larry J.; Cain, Martin W.; Brown, Nathan R., Chemical mechanical polish (CMP) conditioning-disk holder.

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5. Namiki, Keisuke; Yasuda, Hozumi; Nabeya, Osamu; Fukushima, Makoto; Togashi, Shingo; Yamaki, Satoru; Watanabe, Katsuhide, Elastic membrane for semiconductor wafer polishing apparatus.

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6. Baker, III, Arthur Richard; Fetheroff, Steven, Elimination of trapped air under polishing pads.

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7. Bottema, Brian E.; Abraham, Stephen F.; Pamatat, Alex P., Grooved platen with channels or pathway to ambient air.

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8. Gosis Anatoly (Chicago IL), Mask and pressure block for ultra thin work pieces.

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9. Hempel ; Jr. Eugene O. (Garland TX), Method and apparatus for holding a semiconductor wafer during a chemical mechanical polish (CMP) process.

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10. Teruhiko Ichimura JP, Polishing apparatus.

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11. Huang, Shiuh Jer; He, Guang Ling; Lin, Shu Yi, Polishing apparatus and pad replacing method thereof.

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12. Stroupe Hugh (Boise ID) Sharan Sujit (Boise ID) Sandhu Gurtej S. (Boise ID), Polishing apparatus, a polishing wafer carrier apparatus, a replacable component for a particular polishing apparatus an.

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13. Nguyen, Phuong Van, Polishing holder for silicon wafers and method of use thereof.

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14. Kitta Satoru (Nagano JPX) Furukawa Masanori (Nagano JPX), Polishing machine and a method of polishing a work.

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15. Daisuke Kobayashi JP; Tsuyoshi Matsuzaki JP; Hideo Kudo JP, Polishing method for wafer and holding plate.

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16. Olmstead Dennis L. (Sherman TX), Semiconductor wafer polishing using a hydrostatic medium.

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17. Sekiya, Shinnosuke; Yamamoto, Setsuo; Sukegawa, Naoya; Fuwa, Naruto, Semiconductor wafer processing method.

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18. Kinnebrew ; Gerald P. ; Watkins ; Bobby Mack, Silicon slice carrier block and plug assembly.

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19. Nguyen, Phuong Van, Silicon wafer polishing holder and method of use thereof.

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20. Hu, Tien-Chen; Twu, Jih-Churng, Ventilated platen/polishing pad assembly for chemcial mechanical polishing and method of using.

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21. Nagasaka, Munetoshi; Ogasawara, Ikuo; Shinohara, Eiichi, Wafer attracting plate.

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22. Yoshida,Shinji; Nagai,Osamu, Wafer grinding method.

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23. Budinger William D. (16 Southridge Rd. Kennett Square PA 19348), Workpiece holder for polishing operation.

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이 특허를 인용한 특허 (18) 인용/피인용 타임라인 분석

1. Dempster, James; Maynard, Jason, Boat for use in a material deposition apparatus.

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2. Motoyama, Yutaka; Fukushima, Kohei, Dummy wafer.

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3. Motoyama, Yutaka; Fukushima, Kohei, Dummy wafer.

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4. Motoyama, Yutaka; Fukushima, Kohei, Dummy wafer.

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5. Fukushima, Makoto; Yasuda, Hozumi; Namiki, Keisuke; Nabeya, Osamu; Togashi, Shingo; Yamaki, Satoru, Elastic membrane for semiconductor wafer polishing apparatus.

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6. Fukushima, Makoto; Yasuda, Hozumi; Namiki, Keisuke; Nabeya, Osamu; Togashi, Shingo; Yamaki, Satoru, Elastic membrane for semiconductor wafer polishing apparatus.

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7. Fukushima, Makoto; Yasuda, Hozumi; Namiki, Keisuke; Nabeya, Osamu; Togashi, Shingo; Yamaki, Satoru, Elastic membrane for semiconductor wafer polishing apparatus.

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8. Fukushima, Makoto; Yasuda, Hozumi; Namiki, Keisuke; Nabeya, Osamu; Togashi, Shingo; Yamaki, Satoru, Elastic membrane for semiconductor wafer polishing apparatus.

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9. Smith, Eryn, Electrostatic carrier tray.

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10. Harada, Koichiro; Yasui, Takeshi, Heat reflector for substrate processing apparatus.

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11. Harada, Koichiro; Yasui, Takeshi, Heat reflector for substrate processing apparatus.

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12. Dempster, James; Maynard, Jason, Hexcell channel arrangement for use in a boat for a deposition apparatus.

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13. Kinoshita, Masaki; Kimba, Toshifumi, Polishing pad for substrate polishing apparatus.

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14. Flynn, Greg; Richards, Benjamin C., Semiconductor wafer with dicing positions for solar cell fabrication.

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15. Kimura, Ren, Wafer holder for ion implantation.

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16. Kimura, Ren, Wafer holder for ion implantation.

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17. Morisaki, Eisuke; Machiyama, Wataru; Kobayashi, Hirokatsu; Harashima, Masayuki; Sano, Yukio, Wafer holder for manufacturing semiconductor.

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18. Tamaso, Hideto, Wafer holder for stepper.

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