초록 ▼

An apparatus and method for holding a solid precursor in a sublimator such that the solid precursor can be vaporized for saturating a carrier gas. The apparatus may include alternating disks or shelves that form inner and outer passages, as well as spaces between the disks for fluidicly coupling the

An apparatus and method for holding a solid precursor in a sublimator such that the solid precursor can be vaporized for saturating a carrier gas. The apparatus may include alternating disks or shelves that form inner and outer passages, as well as spaces between the disks for fluidicly coupling the passages to create a winding, tortuous fluid flow path through the sublimator for optimizing solid vapor saturation. The method may include directing a carrier gas into a sublimation chamber, around the first shelf in the outer passage, over the first shelf in the space, around the second shelf in the inner passage, and back out of the sublimation chamber.

대표청구항 ▼

1. An apparatus for vaporizing a solid precursor comprising: a container including a sealable opening, a fluid inlet, a fluid outlet and an inner dimension;at least one first shelf having an outer dimension less than the container inner dimension to form an outer passage, and including an inner supp

1. An apparatus for vaporizing a solid precursor comprising: a container including a sealable opening, a fluid inlet, a fluid outlet and an inner dimension;at least one first shelf having an outer dimension less than the container inner dimension to form an outer passage, and including an inner support with an outer dimension;at least one second shelf including an outer support positioned at the container inner dimension, and an opening greater than the outer dimension of the first shelf inner support; andwherein the first shelf is configured to form an overlapping vertical stack with the second shelf for positioning in the container, and a fluid flow path is established between the first shelf and the second shelf through the outer passage. 2. The apparatus according to claim 1, wherein the second shelf opening and the first shelf inner support form an inner passage communicating with the fluid flow path. 3. The apparatus according to claim 2, wherein a horizontal space between the first shelf and the second shelf extends the fluid flow path between the outer and inner passages. 4. The apparatus according to claim 3, wherein the fluid flow path communicates with the fluid inlet and the fluid outlet. 5. The apparatus according to claim 1, further comprising: horizontal spaces between each of the first and second shelves;inner passages between the second shelves and the shaft; andwherein the inner and outer passages extend the fluid flow path around the first and second shelves and the horizontal spaces extend the fluid flow path over the first and second shelves between the fluid inlet and the fluid outlet in the container. 6. The apparatus according to claim 1, wherein the inner channel receives a dip tube. 7. The apparatus according to claim 1, wherein the at least one second shelf opening is configured to receive and pass through the inner support of the at least one first shelf. 8. The apparatus according to claim 1, wherein the at least one first shelf and the at least one second shelf include a horizontal separation space therebetween, such that the fluid flow path extends around the at least one first shelf through the outer passage and over the at least one first shelf through the horizontal separation space. 9. The apparatus according to claim 1, wherein the at least one first shelf comprises at least one annular slot to support a solid precursor. 10. The apparatus according to claim 9, wherein the at least one annular slot comprises at least two annular walls. 11. The apparatus according to claim 1, wherein the container is coupled to a heater. 12. An apparatus for supporting a solid precursor in a sublimation chamber, comprising: a first shelf including a top surface for supporting a solid precursor, a bottom surface, and a vertically oriented inner support;a second shelf including a top surface for supporting a solid precursor, a bottom surface, and a vertically oriented outer support circumferentially disposed thereon and thermally coupled to the sublimation chamber inner wall;an inner passage disposed between the second shelf and the first shelf inner support;an outer passage disposed between the first shelf and the second shelf outer support; anda horizontally disposed space between the first and second shelves establishing a fluid flow path between the inner and outer passages in the sublimation chamber. 13. The apparatus according to claim 12, wherein the first shelf inner support comprises a coupler configured to stack vertically at least one additional first shelf. 14. The apparatus according to claim 13, wherein the second shelf outer support is configured to stack vertically at least one additional second shelf to form an overlapping vertical stack of the first and second shelves, and wherein a plurality of the inner passages, outer passages and horizontal spaces wind the fluid flow path around the stacked shelves in the sublimation chamber. 15. The apparatus according to claim 12, wherein the second shelf bottom surface comprises a centrally disposed opening configured to receive and pass through the first shelf inner support. 16. The apparatus according to claim 12, wherein the first shelf comprises concentric annular walls extending from the top surface and forming at least one annular slot for supporting the solid precursor. 17. The apparatus according to claim 16, wherein the annular walls extend into the horizontal space and do not contact the bottom surface of the adjacent second shelf. 18. The apparatus according to claim 12, wherein the second shelf comprises at least one annular slot disposed on the top surface for supporting the solid precursor. 19. The apparatus according to claim 12, further comprising: at least one retention plate mounted to the top surface of the first shelf and configured for retaining the solid precursor thereon. 20. The apparatus according to the claim 19, wherein at least two annular walls extend from the first shelf top surface to the at least one retention plate. 21. The apparatus according to claim 20, wherein the annular walls form at least one annular slot to support the solid precursor under the retention plate. 22. The apparatus according to claim 19, wherein the at least one retention plate comprises a porous material to retain the solid precursor and pass a saturated vapor.