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Top-gate, bottom-contact organic thin film transistors are provided. The transistors may include metal bilayer electrodes to aid in charge movement within the device. In an embodiment, an organic transistor includes a drain electrode and a source electrode disposed over a first region of a substrate

Top-gate, bottom-contact organic thin film transistors are provided. The transistors may include metal bilayer electrodes to aid in charge movement within the device. In an embodiment, an organic transistor includes a drain electrode and a source electrode disposed over a first region of a substrate, a transition metal oxide layer disposed over and in direct physical contact with the drain electrode and the source electrode, an organic preferentially hole conducting channel layer disposed over the metal oxide and between the drain electrode and the source electrode, and a gate electrode disposed over the channel.

대표청구항 ▼

1. A first device comprising: an organic transistor comprising:a substrate;a drain electrode and a source electrode disposed over a first region of the substrate;a first layer comprising a transition metal oxide disposed over and in direct physical contact with the drain electrode and the source ele

1. A first device comprising: an organic transistor comprising:a substrate;a drain electrode and a source electrode disposed over a first region of the substrate;a first layer comprising a transition metal oxide disposed over and in direct physical contact with the drain electrode and the source electrode;a channel layer comprising an organic hole conducting semiconductor disposed over the first layer, wherein a first portion of the channel layer is disposed between the drain electrode and the source electrode, a second portion of the channel layer is disposed over a portion of the drain electrode, and a third portion of the channel layer is disposed over a portion of the source electrode, a first organic-on-metal interface between the drain electrode and second portion of the channel layer, and a second organic-on-metal interface between the source electrode and the third portion of the channel layer; anda gate electrode disposed over the channel layer. 2. The first device of claim 1, wherein the channel layer is in direct physical contact with the first layer. 3. The first device of claim 1, wherein the transition metal is selected from the group consisting of molybdenum, tungsten, titanium, nickel, copper, and vanadium. 4. The first device of claim 1, wherein the transition metal oxide is MoO3. 5. The first device of claim 1, wherein the channel layer comprises pentacene. 6. The first device of claim 1, wherein the drain and source electrodes comprise Au. 7. The first device of claim 1, wherein the gate electrode comprises parylene-C. 8. The first device of claim 1, further comprising an organic photodetector disposed over a second region of the substrate and adjacent to the organic transistor, wherein the drain electrode extends over the second region of the substrate to form an electrode of the organic photo detector. 9. The first device of claim 1, wherein the substrate surface, over which the layers are disposed, is a non-developable surface. 10. The first device of claim 1, wherein the first device is an imaging sensor. 11. The first device of claim 1, wherein the first device is a camera. 12. The first device of claim 1, wherein the first device comprises a plurality of organic transistors arranged in an array, and the organic transistor is one of the plurality of organic transistors. 13. A method of fabricating a device, comprising: depositing a drain electrode and a source electrode over a substrate;depositing a first layer comprising a transition metal over the drain electrode and the source electrode;depositing a channel layer comprising an organic hole conducting material over the first layer, wherein a first portion of the channel layer is disposed between the drain electrode and the source electrode, a second portion of the channel layer is disposed over a portion of the drain electrode, and a third portion of the channel layer is disposed over a portion of the source electrode, a first organic-on-metal interface between the drain electrode and second portion of the channel layer and a second organic-on-metal interface between the source electrode and the third portion of the channel layer; anddepositing a gate electrode over the channel layer. 14. The method of claim 13, wherein the channel layer is in direct physical contact with the first layer. 15. The method of claim 13, wherein the transition metal is selected from the group consisting of molybdenum, tungsten, titanium, nickel, copper, and vanadium. 16. The method of claim 13, wherein the transition metal oxide is MoO3. 17. The method of claim 13, wherein the channel layer comprises pentacene. 18. The method of claim 13, wherein the drain and source electrodes comprise Au. 19. The method of claim 13, wherein the gate electrode comprises parylene-C. 20. The method of claim 13, further comprising: fabricating an organic photodetector over a second region of the substrate and adjacent to the organic transistor, wherein the drain electrode extends over the second region of the substrate to form an electrode of the organic photodetector.