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NTIS 바로가기반도체디스플레이기술학회지 = Journal of the semiconductor & display technology, v.21 no.3, 2022년, pp.74 - 79
권혁성 (한국표준과학연구원 진공소재측정팀) , 김민중 (한국표준과학연구원 진공소재측정팀) , 소종호 (한국표준과학연구원 진공소재측정팀) , 신재수 (대전대학교 신소재공학과) , 정진욱 (한양대학교 전기공학과) , 맹선정 (한국표준과학연구원 진공소재측정팀) , 윤주영 (한국표준과학연구원 진공소재측정팀)
In this study, the plasma corrosion resistance and the change in the number of contamination particles generated using the plasma etching process and cleaning process of coating parts for semiconductor plasma etching equipment were investigated. As the coating method, atmospheric plasma spray (APS) ...
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