초록

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Abstract ▼ AI-Helper

In this paper, a new parallel computation method, which fully utilize the parallel processors both in mesh generation and FEM calculation for 2D/3D process simulation, is presented. High performance parallel FEM and parallel linear algebra solving technique was showed that excessive computational re...

In this paper, a new parallel computation method, which fully utilize the parallel processors both in mesh generation and FEM calculation for 2D/3D process simulation, is presented. High performance parallel FEM and parallel linear algebra solving technique was showed that excessive computational requirement of memory size and CPU time for the three-dimensional simulation could be treated successively. Our parallelized numerical solver successfully interpreted the transient enhanced diffusion (TED) phenomena of dopant diffusion and irregular shape of R-LOCOS within 15 minutes. Monte Carlo technique requires excessive computational requirement of CPU time. Therefore high performance parallel solving technique were employed to our cascade sputter simulation. The simulation results of Our sputter simulator allowed the calculation time of 520 sec and speedup of 25 using 30 processors. We found the optimized number of ion injection of our MC sputter simulation is 30,000.