최소 단어 이상 선택하여야 합니다.
최대 10 단어까지만 선택 가능합니다.
다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기한국정밀공학회지 = Journal of the Korean Society for Precision Engineering, v.20 no.3 = no.144, 2003년, pp.15 - 22
정준호 (한국기계연구원 지능형정밀기계연구부) , 신영재 (한국기계연구원 지능형정밀기계연구부) , 이응숙 (한국기계연구원 지능형정밀기계연구부) , 황경현 (한국기계연구원)
초록이 없습니다.
Chou, S. Y., Krauss, P. R., Renstrom, P. J., 'Nanoimprint lithography,' J. Vac. Sci. Technol. B, Vol. 14(6),pp. 4129-4133, 1996
Krauss, P. R., Chou, S. Y., 'Nano-compact disks with 400Gbit/ ${in}^²$ storage density fabricated using nanoimprint lithography and read with proximal probe,' Appl. Phys. Lett., Vol. 71(21), pp. 3174-3716, 1997
Yu, Z., Schablitsky, S. J., Chou, S. Y., 'Nanoscale GaAs metel-semiconductor-metal phtodetectors fabricated using nanoimprint lithography,' Appl. Phys. Lett., Vol. 74(16),pp. 2381-2383, 1999
Cao, H., Yu, Z., Wang, J., Tegenfeldt, J. O., Austin, R. H., Chen, E., Wu, W. and Chou, S. Y., 'Fabrication of 10nm enclosed nanofluidic channels,' Appl. Phys. Lett., Vol. 81(1),pp. 174-176, 2002
Chou, S. Y., Keimel, C., Gu, J., 'Ultrafast and direct imprint of nanostructures in silicon,' Nature, Vol. 417,pp.835-837, 2002
Xia, Q., Keimel, C., Ge, H., Yu, Z., Wu, W., Chou, S. Y., 'Nanosecond patterning of naostructures in polymers using laser-assisted nanoimprint lithography(LA-NIL),' The First Conference on Nanoimprint and Nanoprint Technology, San Francisco, CA, Decemver 11-13, 2002
Colburn, M., Johnson, S., Stewart, M., Damle, S., Bailey, T., Choi, B., Wedlake, M., Michaelson, T., Sreenivasan, S. V., Ekerdt, J., Wilson, C. G., 'Step and flash imprint lighography: a new approach to high-resolution pattering,' SPIE's 24th International Symposium on Microlithography: Emerging Lithographic Technologies III, Santa Clara, CA, Vol. 3676(I), pp. 379-389,1999
Haisma, J., Verheijen, M., Heuvel, K., 'Mold-assisted nanolithography: A process for reliable pattern replication,' J. Vac. Sci. Technol. B, Vol. 14(6), pp. 4124-4128, 1996
Sreenivasan, S. V., 'Nanoimprint lithography using UV curable liquids', ASME International Conference on Integrated Nanosystems, Berkelely, CA, September 18-20, 2002
Bailey, T. C., Resnick, D. J., Mancini, D., Nordquist, K. J., Dauksher, W. J., Ainley, E., Talin, A., Gehoski, K., Baker, J. H., Choi, B. J., Johnson, S., Colburn, M., Meissl, M., Sreenivasan, S. V., Ekerdt, J. G., Willson, C. G., 'Template fabrication schemes for step and flash imprint lithography,' Microelectronics Eng, Vol. 61-62, pp. 461-467, 2002
Bulthaup, C. A., Wilhelm, E. J., Hubert, B. N., Ridley, B. A., Jacobson, J. M., 'All-additive fabrication of inorganic logic elements by liquid embossing,' Appl. Phys. Lett., Vol. 79(10),pp. 1525-1527, ,2001
Scheer, H. C., Schulz, H., Hoffmann, T., Torres, C. M. S., 'Problems of the nanoimprinting technique for nanometer scale pattern definition,' J. Vac. Sci. Technol. B, Vol. 16(6), pp. 3917-3921, 1998
Heidari, B., Maximov, I., Montelius, L., 'Nanoimprint lithography at the 6 in. wafer scale,'J. Vac. Sci. Technol. B, Vol.18(6),pp. 3557-3560, 2000
Heydermann, L. J., Schift, H., Davied, C., Gobrecht, J., Schweizer, T., 'Flow behavior of thin polymer films used for hot embossing lithography,' Microelectronics Eng., Vol. 54, pp. 229-245, 2000
Otto, M., Bender, M., Hadam, B., Spangenberg, B., Kurz, H., 'Characterization and application of a UV-based imprint technique,' Microelectronics Eng., Vol. 57-58, pp. 361-366, 2001
Schulz, H., Korbes, A. S., Scheer, H. C., Balk, L. J., 'Combination of local tailoring of sidewalls of nonometer devices,' Microelectronics Eng., Vol. 53, pp. 221-224, 2000
Pfeiffer, K., Fink, M., Gruetzner, G., Bleidiessel, G., Schulz, H., Sheer, H., 'Multistep profiles by mix and match of nanoimprint and UV lithography,' Microelectronics Eng., Vol. 57-58, pp. 381-387, 2001
Shulz, H., Roos, N., Bendfeldt, L., Pfeiffer, K., Glinsner, T., Scheer, H. C., 'Multi-stack 4 inch wafer-scale imprint lithography with a commertial wafer bonder', 45th International Conference on Electron, Ion & Photon Beam Technology and Nanofabrication, 2001
Roos, N., Luxbacher, T., Glinsner, T., Pfeiffer, K., Schulz, H., Scheer, H. C., 'Nanoimprint lithography with a commercial 4 inch bond system for hot embossing,' SPIE'S Microlithography, Santa Clara, CA, February 27-28, 2001
Lebib, A., Chen, Y., Cambril, E., Youinou, P., Studer, V., Natali, M., Pepin, A., Janssen, H. M., Sijbesman, R. P., 'Room-temperature and low-pressure nanoimprint lithography,' Microelectronics Eng., Vol.61-62, pp. 371-377, 2002
Pfeiffer, K., Fink, M., Ahrens, G., Gruetzner, G., Reuther, F., Seekamp, J., Zankovych, S., Torres, C. M. S., Maximov, I., Beck, M., Graczyk, M., Montelius, L., Schulz, H., Scheer, H. C., Steingrueber, F., 'Polymer stamp for nanoimprint,' Microelectronics Eng., Vol. 61-62, pp. 393-398, 2002
Haatainnen, T. and Ahopelto, J., 'Step & stamp imprint lithography: A versatile method for nanoimprint,' The First Conference on Nanoimprint and Nanoprint Technology, San Francisco, CA, December 11-13, 2002
Bender, M., Otto, M., Hadam, B., Vratzov, B., Spangenberg, B. and Kurz, H., 'Fabrication of Nanostructures using a UV-based imprint technique,' Microelectronics Eng., Vol. 53, pp. 233-236, 2000
Bender, M., Otto, M., Hadam, B., Spangenberg, B. and Kurz H., 'Multiple imprinting in UV-based nanoimprint lithography related material issues,' Microelectronics Eng., Vol. 61-62, pp. 407-413, 2002
Taniguchi, J., Tokano, Y., Miyamoto, I., Komuro, M., Hiroshima, H., Kobayashi, K., Miyazaki, T. and Ohyi, H., 'Preparation of diamond mold using electron beam lithography for application to nanoimprint lithography,' Jpn. J. Appl. Phys., Vol.39, pp. 7070-7074, 2000
Taniguchi, J., Tokano, Y., Miyamoto, I., Komuro, M. and Hiroshima, H., 'Diamond nanoimprint lithography,' Nanotechnology, Vol. 13, pp. 592-596, 2002
Taniguchi, J., Kawasaki, T., Tokano, Y., Kogo, Y., Miyamoto, I., Komuro, M., Hiroshima, H., Sakai, N. and Tada, K., 'Measurement of adhesive force between mood and photocurable resin in imprint technology,' Jpn. J. Appl. Phys., Vol. 41, pp. 4194-4197, 2002
Hirai, Y., Harada, S., Isaka, S., Kobayashi, M., and Tanaka, Y., 'Nano-imprint lithography using replicated mold by Ni electroforming,' Jpn. J. Appl. Phys., Vol. 41, pp. 4186-189, 2002
Igaku, Y., Matsui, S., Ishigaki, H., Fujita, J., Ishida, M., Ochiai, Y., Namatsu, H., Komuro, M. and Hiroshima, H. 'Room temperature nanoimprint technology using Hydrogen Silsequioxane(HSQ),' Jpn. J. Appl. Phys., Vol. 41, pp.4198-4202, 2002
Komuro, M., Tokano, Y., Taniguchi, J., Kawasaki, T., Miyamoto, I. and Hiroshima, H., 'Improvement of imprinted pattern uniformity using sapphire mold,' Jpn. J. Appl. Phys., Vol. 41, pp. 4182-4185, 2002
Hiroshima, H., Komuro, M., Kasahara, N., Kurashima, Y., Taniguchi, J. and Miyamoto, I., 'Elimination of bubble defects during nanoimprint in atmospheric ambient,' The First Conference on Nanoimprint and Nanoprint Technology, San Francisco, CA, December 11-13, 2002
Khang, D. Y. and Lee, H. H., 'Room-temperature imprint lithography by solvent vapor treatment,' Appl. Phys. Lett., Vol. 76(7),pp. 870-872, 2000
Suh, K. Y., Kim, Y. S. and Lee, H. H.. 'Capillary force lithography,' Adv. Mater., Vol. 13(18), pp. 1386-1389, 2001
Khang, D. Y., Yoon, H. and Lee, H. H., 'Room-temperature imprint lithography,' Adv. Mater., Vol. 13(10), pp. 749-752, 2001
Kim, Y. S., Suh, K. Y. and Lee, H. H., 'Fabrication of three-dimensional microstructures by soft molding,' Appl. Phys. Lett., Vol. 79(14),pp. 2285-2287, 2001
※ AI-Helper는 부적절한 답변을 할 수 있습니다.