참고문헌 (35)

1. Chou, S. Y., Krauss, P. R., Renstrom, P. J., 'Nanoimprint lithography,' J. Vac. Sci. Technol. B, Vol. 14(6),pp. 4129-4133, 1996 

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2. Krauss, P. R., Chou, S. Y., 'Nano-compact disks with 400Gbit/ ${in}^²$ storage density fabricated using nanoimprint lithography and read with proximal probe,' Appl. Phys. Lett., Vol. 71(21), pp. 3174-3716, 1997 

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3. Yu, Z., Schablitsky, S. J., Chou, S. Y., 'Nanoscale GaAs metel-semiconductor-metal phtodetectors fabricated using nanoimprint lithography,' Appl. Phys. Lett., Vol. 74(16),pp. 2381-2383, 1999 

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4. Cao, H., Yu, Z., Wang, J., Tegenfeldt, J. O., Austin, R. H., Chen, E., Wu, W. and Chou, S. Y., 'Fabrication of 10nm enclosed nanofluidic channels,' Appl. Phys. Lett., Vol. 81(1),pp. 174-176, 2002 

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5. Chou, S. Y., Keimel, C., Gu, J., 'Ultrafast and direct imprint of nanostructures in silicon,' Nature, Vol. 417,pp.835-837, 2002 

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6. Xia, Q., Keimel, C., Ge, H., Yu, Z., Wu, W., Chou, S. Y., 'Nanosecond patterning of naostructures in polymers using laser-assisted nanoimprint lithography(LA-NIL),' The First Conference on Nanoimprint and Nanoprint Technology, San Francisco, CA, Decemver 11-13, 2002 

7. Colburn, M., Johnson, S., Stewart, M., Damle, S., Bailey, T., Choi, B., Wedlake, M., Michaelson, T., Sreenivasan, S. V., Ekerdt, J., Wilson, C. G., 'Step and flash imprint lighography: a new approach to high-resolution pattering,' SPIE's 24th International Symposium on Microlithography: Emerging Lithographic Technologies III, Santa Clara, CA, Vol. 3676(I), pp. 379-389,1999 

   

8. Haisma, J., Verheijen, M., Heuvel, K., 'Mold-assisted nanolithography: A process for reliable pattern replication,' J. Vac. Sci. Technol. B, Vol. 14(6), pp. 4124-4128, 1996 

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9. Sreenivasan, S. V., 'Nanoimprint lithography using UV curable liquids', ASME International Conference on Integrated Nanosystems, Berkelely, CA, September 18-20, 2002 

10. Bailey, T. C., Resnick, D. J., Mancini, D., Nordquist, K. J., Dauksher, W. J., Ainley, E., Talin, A., Gehoski, K., Baker, J. H., Choi, B. J., Johnson, S., Colburn, M., Meissl, M., Sreenivasan, S. V., Ekerdt, J. G., Willson, C. G., 'Template fabrication schemes for step and flash imprint lithography,' Microelectronics Eng, Vol. 61-62, pp. 461-467, 2002 

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11. Bulthaup, C. A., Wilhelm, E. J., Hubert, B. N., Ridley, B. A., Jacobson, J. M., 'All-additive fabrication of inorganic logic elements by liquid embossing,' Appl. Phys. Lett., Vol. 79(10),pp. 1525-1527, ,2001 

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12. Scheer, H. C., Schulz, H., Hoffmann, T., Torres, C. M. S., 'Problems of the nanoimprinting technique for nanometer scale pattern definition,' J. Vac. Sci. Technol. B, Vol. 16(6), pp. 3917-3921, 1998 

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13. Heidari, B., Maximov, I., Montelius, L., 'Nanoimprint lithography at the 6 in. wafer scale,'J. Vac. Sci. Technol. B, Vol.18(6),pp. 3557-3560, 2000 

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14. Heydermann, L. J., Schift, H., Davied, C., Gobrecht, J., Schweizer, T., 'Flow behavior of thin polymer films used for hot embossing lithography,' Microelectronics Eng., Vol. 54, pp. 229-245, 2000 

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15. Otto, M., Bender, M., Hadam, B., Spangenberg, B., Kurz, H., 'Characterization and application of a UV-based imprint technique,' Microelectronics Eng., Vol. 57-58, pp. 361-366, 2001 

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16. Schulz, H., Korbes, A. S., Scheer, H. C., Balk, L. J., 'Combination of local tailoring of sidewalls of nonometer devices,' Microelectronics Eng., Vol. 53, pp. 221-224, 2000 

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17. Pfeiffer, K., Fink, M., Gruetzner, G., Bleidiessel, G., Schulz, H., Sheer, H., 'Multistep profiles by mix and match of nanoimprint and UV lithography,' Microelectronics Eng., Vol. 57-58, pp. 381-387, 2001 

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18. Shulz, H., Roos, N., Bendfeldt, L., Pfeiffer, K., Glinsner, T., Scheer, H. C., 'Multi-stack 4 inch wafer-scale imprint lithography with a commertial wafer bonder', 45th International Conference on Electron, Ion & Photon Beam Technology and Nanofabrication, 2001 

19. Roos, N., Luxbacher, T., Glinsner, T., Pfeiffer, K., Schulz, H., Scheer, H. C., 'Nanoimprint lithography with a commercial 4 inch bond system for hot embossing,' SPIE'S Microlithography, Santa Clara, CA, February 27-28, 2001 

20. Lebib, A., Chen, Y., Cambril, E., Youinou, P., Studer, V., Natali, M., Pepin, A., Janssen, H. M., Sijbesman, R. P., 'Room-temperature and low-pressure nanoimprint lithography,' Microelectronics Eng., Vol.61-62, pp. 371-377, 2002 

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21. Pfeiffer, K., Fink, M., Ahrens, G., Gruetzner, G., Reuther, F., Seekamp, J., Zankovych, S., Torres, C. M. S., Maximov, I., Beck, M., Graczyk, M., Montelius, L., Schulz, H., Scheer, H. C., Steingrueber, F., 'Polymer stamp for nanoimprint,' Microelectronics Eng., Vol. 61-62, pp. 393-398, 2002 

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22. Haatainnen, T. and Ahopelto, J., 'Step & stamp imprint lithography: A versatile method for nanoimprint,' The First Conference on Nanoimprint and Nanoprint Technology, San Francisco, CA, December 11-13, 2002 

23. Bender, M., Otto, M., Hadam, B., Vratzov, B., Spangenberg, B. and Kurz, H., 'Fabrication of Nanostructures using a UV-based imprint technique,' Microelectronics Eng., Vol. 53, pp. 233-236, 2000 

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24. Bender, M., Otto, M., Hadam, B., Spangenberg, B. and Kurz H., 'Multiple imprinting in UV-based nanoimprint lithography related material issues,' Microelectronics Eng., Vol. 61-62, pp. 407-413, 2002 

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25. Taniguchi, J., Tokano, Y., Miyamoto, I., Komuro, M., Hiroshima, H., Kobayashi, K., Miyazaki, T. and Ohyi, H., 'Preparation of diamond mold using electron beam lithography for application to nanoimprint lithography,' Jpn. J. Appl. Phys., Vol.39, pp. 7070-7074, 2000 

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26. Taniguchi, J., Tokano, Y., Miyamoto, I., Komuro, M. and Hiroshima, H., 'Diamond nanoimprint lithography,' Nanotechnology, Vol. 13, pp. 592-596, 2002 

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27. Taniguchi, J., Kawasaki, T., Tokano, Y., Kogo, Y., Miyamoto, I., Komuro, M., Hiroshima, H., Sakai, N. and Tada, K., 'Measurement of adhesive force between mood and photocurable resin in imprint technology,' Jpn. J. Appl. Phys., Vol. 41, pp. 4194-4197, 2002 

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28. Hirai, Y., Harada, S., Isaka, S., Kobayashi, M., and Tanaka, Y., 'Nano-imprint lithography using replicated mold by Ni electroforming,' Jpn. J. Appl. Phys., Vol. 41, pp. 4186-189, 2002 

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29. Igaku, Y., Matsui, S., Ishigaki, H., Fujita, J., Ishida, M., Ochiai, Y., Namatsu, H., Komuro, M. and Hiroshima, H. 'Room temperature nanoimprint technology using Hydrogen Silsequioxane(HSQ),' Jpn. J. Appl. Phys., Vol. 41, pp.4198-4202, 2002 

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30. Komuro, M., Tokano, Y., Taniguchi, J., Kawasaki, T., Miyamoto, I. and Hiroshima, H., 'Improvement of imprinted pattern uniformity using sapphire mold,' Jpn. J. Appl. Phys., Vol. 41, pp. 4182-4185, 2002 

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31. Hiroshima, H., Komuro, M., Kasahara, N., Kurashima, Y., Taniguchi, J. and Miyamoto, I., 'Elimination of bubble defects during nanoimprint in atmospheric ambient,' The First Conference on Nanoimprint and Nanoprint Technology, San Francisco, CA, December 11-13, 2002 

32. Khang, D. Y. and Lee, H. H., 'Room-temperature imprint lithography by solvent vapor treatment,' Appl. Phys. Lett., Vol. 76(7),pp. 870-872, 2000 

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33. Suh, K. Y., Kim, Y. S. and Lee, H. H.. 'Capillary force lithography,' Adv. Mater., Vol. 13(18), pp. 1386-1389, 2001 

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34. Khang, D. Y., Yoon, H. and Lee, H. H., 'Room-temperature imprint lithography,' Adv. Mater., Vol. 13(10), pp. 749-752, 2001 

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35. Kim, Y. S., Suh, K. Y. and Lee, H. H., 'Fabrication of three-dimensional microstructures by soft molding,' Appl. Phys. Lett., Vol. 79(14),pp. 2285-2287, 2001 

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