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NTIS 바로가기한국세라믹학회지 = Journal of the Korean Ceramic Society, v.45 no.9 = no.316, 2008년, pp.567 - 571
박종훈 (한국원자력연구원 원자력재료연구부) , 정충환 (한국원자력연구원 원자력재료연구부) , 김원주 (한국원자력연구원 원자력재료연구부) , 김도진 (충남대학교 재료공학과) , 박지연 (한국원자력연구원 원자력재료연구부)
The properties of a grown film by the chemical vapor deposition process depend on the deposition temperature because the deposition mechanism of the CVD film is controlled by the deposition temperature. The preferred orientation of the zrC film changed from (111) to (220) or (200) with an increase o...
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