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NTIS 바로가기Transactions on electrical and electronic materials, v.14 no.4, 2013년, pp.203 - 207
Choi, Jeong-Ho (Department of Electrical & Electronic & Communication Engineering, Korea University of Technology and Education) , Roh, Si-Cheol (Department of Electrical & Electronic & Communication Engineering, Korea University of Technology and Education) , Jung, Jong-Dae (Department of Electrical & Electronic & Communication Engineering, Korea University of Technology and Education) , Seo, Hwa-Il (Department of Electrical & Electronic & Communication Engineering, Korea University of Technology and Education)
P-type Si wafers were dipped in HF solution. The minority carrier lifetime (lifetime) increased after HF treatment due to the hydrogen termination effect. To investigate the film passivation effect, PECVD was used to deposit Keyword
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