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NTIS 바로가기한국기계가공학회지 = Journal of the Korean Society of Manufacturing Process Engineers, v.16 no.5, 2017년, pp.40 - 46
박휘근 (금오공과대학교 기계설계공학과) , 이원석 (금오공과대학교 기계설계공학과) , 강동원 (금오공과대학교 기계설계공학과) , 박인승 (금오공과대학교 기계설계공학과) , 이종찬 (금오공과대학교 기계설계공학과)
A plasma gas control apparatus for semiconductor plasma etching processes securely holds a cathode for forming a plasma, confines the plasma during the plasma etching process, and discharges gas after etching. It is a key part of the etching process. With the advancement of semiconductor technology,...
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