[논문]Pulsed DC 마그네트론 스퍼터링으로 제조된 다층 광학박막의 특성

김동원

doi:10.5695/jkise.2019.52.4.211

[국내논문] Pulsed DC 마그네트론 스퍼터링으로 제조된 다층 광학박막의 특성
The Properties of Multi-Layered Optical Thin Films Fabricated by Pulsed DC Magnetron Sputtering 원문보기

한국표면공학회지 = Journal of the Korean institute of surface engineering, v.52 no.4, 2019년, pp.211 - 226

Abstract ▼ AI-Helper

Optical thin films were deposited by using a reactive pulsed DC magnetron sputtering method with a high density plasma(HDP). In this study, the effect of sputtering process conditions on the microstructure and optical properties of $SiO_2$, $TiO_2$, $Nb_2O_5$ thin films was clarified. These thin films had flat and dense microstructure, stable stoichiometric composition at the optimal conditions of low working pressure, high pulsed DC power and RF power(HDP). Also, the refractive index of the $SiO_2$ thin films was almost constant, but the refractive indices of $TiO_2$ and $Nb_2O_5$ thin films were changed depending on the microstructure of these films. Antireflection films of $Air/SiO_2/Nb_2O_5/SiO_2/Nb_2O_5/SiO_2/Nb_2O_5/Glass$ structure designed by Macleod program were manufactured by our developed sputtering system. Transmittance and reflectance of the manufactured multilayer films showed outstanding value with the level of 95% and 0.3%, respectively, and also had excellent durability.

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표/그림 (10)

표 Table 1. Main system and functions of pulsed DC magnetron sputtering equipment.
표 Table 2. Experimental conditions of pulsed DC magnetron sputtering process for SiO₂, TiO₂ and Nb₂O₅ films.
표 Table 3. Reliability test conditions for multi-layered optical thin films.
$Fig. 1. FE-SEM surface and cross sectional images, AFM images of low refractive index SiO2 films deposited on optical glass substrate at various process variables : (a) Coarse columnar microstructure (b)~(g) Fine columnar microstructure (h) Dense microstructure.$ 그림 Fig. 1. FE-SEM surface and cross sectional images, AFM images of low refractive index SiO₂ films deposited on optical glass substrate at various process variables : (a) Coarse columnar microstructure (b)~(g) Fine columnar microstructure (h) Dense microstructure.
$Fig. 2. FE-SEM surface and cross sectional images, AFM images and density of high refractive index Nb2O5 films deposited on optical glass substrate at various process variables : (a) Coarse columnar microstructure (b)~(g) Fine columnar microstructure (h) Dense microstructure.$ 그림 Fig. 2. FE-SEM surface and cross sectional images, AFM images and density of high refractive index Nb₂O₅ films deposited on optical glass substrate at various process variables : (a) Coarse columnar microstructure (b)~(g) Fine columnar microstructure (h) Dense microstructure.
$Fig. 3. Refractive index of SiO2, TiO2 and Nb2O5 thin films at 550 nm according to sputter deposition variables and film microstructure : (a) Working pressure (b) Pulsed-DC power (c) RF power (d) Film microstructure.$ 그림 Fig. 3. Refractive index of SiO₂, TiO₂ and Nb₂O₅ thin films at 550 nm according to sputter deposition variables and film microstructure : (a) Working pressure (b) Pulsed-DC power (c) RF power (d) Film microstructure.
$Fig. 4. XPS spectra and atomic concentrations of low refractive index SiO2 and high refractive index Nb2O5 thin films.$ 그림 Fig. 4. XPS spectra and atomic concentrations of low refractive index SiO₂ and high refractive index Nb₂O₅ thin films.
그림 Fig. 5. Multi-layered structure of Macleod method, FE-SEM and AFM images of SiO₂/Nb₂O₅ antireflection films with 6 layers : (a) Schematic structure of multi-layered film (b) Cross sectional FE-SEM image (c) Surface FE-SEM image (d) Surface roughness analyzed by AFM (e) Comparison between theoretical thickness calculated by Macleod method and experimentally thickness measured by FE-SEM.
그림 Fig. 6. Reflectance and transmittance spectra of optical glass, SiO₂/Nb₂O₅/SiO₂/Nb₂O₅/SiO₂/Nb₂O₅ antireflection films with coarse columnar and dense microstructure, respectively : (a) Reflectance spectra (b) Transmittance spectra.
그림 Fig. 7. Variation of transmittance spectra of SiO₂/Nb₂O₅/SiO₂/Nb₂O₅/SiO₂/Nb₂O₅ antireflection films after several reliability test : (a) Thermal shock test (b) High temperature storage test (c) Salt spray test (d) High temperature and high humidity test.

질의응답

핵심어	질문	논문에서 추출한 답변
	기계적 내구성이 떨어지는 MgF2를 대체할 수 있는 물질은?	38의 매우 낮은 굴절률을 갖는 MgF2가 있지만 상기 물질은 외부환경에 민감하여 기계적 내구성이 떨어진다 는 단점이 있다. 따라서 1.46의 다소 높은 굴절률을 갖지만 유리 기판에 증착이 용이하고 외부 환경에 대해 우수한 내구성을 가지는 SiO2를 사용하는 것이 일반적이다. SiO2 박막은 200 ~ 4500 nm의 매우 넓은 투과 파장 범위를 나타내며 광의 흡수율과 굴절률이 낮아서 다층 구조의 광학 박막에 많이 사용되는 물질이다.
	다층 반사방지막의 특징은?	다층 반사방지막의 저굴절률 물질로는 1.38의 매우 낮은 굴절률을 갖는 MgF2가 있지만 상기 물질은 외부환경에 민감하여 기계적 내구성이 떨어진다 는 단점이 있다. 따라서 1.
	반사방지막의 응용분야는?	최근 광학 및 광통신, 디스플레이 기술 등의 발전으로 모바일 전자기기, 가전제품, 자동차, 센서와 같은 응용분야들이 다양해짐에 따라 광학박막의 설계, 증착 기술 및 측 정 기술의 발전이 함께 요구되고 있다. 광학박막에는 자외선과 가시광선 영역의 빛은 차단하고 적외선 영역의 빛만을 투과시키는 장파장 투과 필터, 특정 파장의 빛만을 투과시키는 협대역투과필터, 표 면에서의 반사율을 높여주는 고반사 코팅, 빛의 반 사를 줄이고 투과를 높이는 반사방지막들이 있으며 [1], 특히 반사방지막은 디스플레이, 광학기기, 태양 전지, 건축 등 가장 넓은 분야에서 응용되어지고 있다.

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