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NTIS 바로가기반도체디스플레이기술학회지 = Journal of the semiconductor & display technology, v.20 no.4, 2021년, pp.146 - 150
유상원 (서울대학교 공과대학 에너지시스템공학부) , 권지원 (서울대학교 공과대학 에너지시스템공학부)
Plasma information based virtual metrology (PI-VM) that predicts wafer-to-wafer etch rate variation after wet cleaning of plasma facing parts was developed. As input parameters, plasma information (PI) variables such as electron temperature, fluorine density and hydrogen density were extracted from ...
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