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NTIS 바로가기반도체디스플레이기술학회지 = Journal of the semiconductor & display technology, v.20 no.2, 2021년, pp.19 - 24
두현철 (명지대학교 전자공학과) , 홍상진 (명지대학교 전자공학과)
As the size of semiconductor devices decreases, the etching pattern becomes very narrow and a deep high aspect ratio process becomes important. The cryogenic etching process enables high aspect ratio etching by suppressing the chemical reaction of reactive ions on the sidewall while maintaining the ...
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