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NTIS 바로가기Korean chemical engineering research = 화학공학, v.60 no.2, 2022년, pp.313 - 319
김유경 (단국대학교 화학공학과) , 손주연 (단국대학교 화학공학과) , 이승섭 (단국대학교 화학공학과) , 전주호 (단국대학교 화학공학과) , 김만경 (단국대학교 화학공학과) , 장수환 (단국대학교 화학공학과)
AlGaN/GaN based HfO2 MOSHEMT (metal oxide semiconductor high electron transistor) with different gate recess depth was simulate to demonstrate a successful normally-off operation of the transistor. Three types of the HEMT structures including a conventional HEMT, a gate-recessed HEMT with 3 nm thick...
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