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フォトポリマ-懇話會誌= Journal of photopolymer science and technology, v.21 no.1, 2008년, pp.107 - 112
Ishi, Junichi (Sony Chemical & Information Device Corporation) , Sunaga, Tomoyasu (Sony Chemical & Information Device Corporation) , Nomura, Mamiko (Sony Chemical & Information Device Corporation) , Kanaya, Hiroki (Sony Chemical & Information Device Corporation)
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Two types of photosensitive polyimides (PSPIs) were developed as novel cover layer materials for FPC applications in this work. One of them, PSPI-1 was highly soluble in common organic solvents such as NMP in spite of its stiff backbone structure. The PSPI-1 film formed by simple solution-casting ex...
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