최소 단어 이상 선택하여야 합니다.
최대 10 단어까지만 선택 가능합니다.
다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기Journal of applied physics, v.109 no.1, 2011년, pp.013306 -
Lee, Young-Kwang (Hanyang University Department of Electrical Engineering, , 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, South Korea) , Chung, Chin-Wook (Hanyang University Department of Electrical Engineering, , 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, South Korea)
Contribution of stepwise ionization to total ionization was experimentally investigated in low-pressure inductively coupled argon plasmas. In the pressure range 3-50 mTorr, optical emission spectroscopy was employed to determine metastable fractions (metastable density relative to ground state densi...
Plasma Sources Sci. Technol. 1 109 1992 10.1088/0963-0252/1/2/006
J. Appl. Phys. 49 3814 1978 10.1063/1.325385
J. Appl. Phys. 73 3668 1993 10.1063/1.352926
Plasma Sources Sci. Technol. 15 S137 2006 10.1088/0963-0252/15/4/S01
J. Phys. D: Appl. Phys. 37 R143 2004 10.1088/0022-3727/37/12/R01
J. Appl. Phys. 80 2624 1996 10.1063/1.363178
Phys. Rev. E 58 7823 1998 10.1103/PhysRevE.58.7823
J. Appl. Phys. 95 870 2004 10.1063/1.1636527
Plasma Sources Sci. Technol. 18 035017 2009 10.1088/0963-0252/18/3/035017
J. Phys. D: Appl. Phys. 41 065206 2008 10.1088/0022-3727/41/6/065206
J. Korean Phys. Soc. 52 1792 2008 10.3938/jkps.52.1792
J. Appl. Phys. 101 073309 2007 10.1063/1.2715845
J. Appl. Phys. 57 82 1985 10.1063/1.335400
J. Appl. Phys. 91 3539 2002 10.1063/1.1452772
J. Appl. Phys. 98 113304 2005 10.1063/1.2137883
Appl. Phys. Lett. 87 131502 2005 10.1063/1.2056592
J. Phys. D: Appl. Phys. 41 155203 2008 10.1088/0022-3727/41/15/155203
J. Vac. Sci. Technol. A 20 555 2002 10.1116/1.1454126
Principles of Plasma Discharges and Materials Processing 2nd ed. 2004
2008
J. Phys. D: Appl. Phys. 37 2827 2004 10.1088/0022-3727/37/20/009
Phys. Rev. A 57 267 1998 10.1103/PhysRevA.57.267
Phys. Rev. A 59 2749 1999 10.1103/PhysRevA.59.2749
Appl. Phys. Lett. 75 328 1999 10.1063/1.124365
J. Phys. D: Appl. Phys. 42 145206 2009 10.1088/0022-3727/42/14/145206
J. Chem. Phys. 43 1464 1965 10.1063/1.1696957
Phys. Rev. A 20 445 1979 10.1103/PhysRevA.20.445
J. Phys. B 32 4249 1999 10.1088/0953-4075/32/17/309
Plasma Sources Sci. Technol. 16 399 2007 10.1088/0963-0252/16/2/025
Phys. Plasmas 13 053502 2006 10.1063/1.2193535
J. Appl. Phys. 84 121 1998 10.1063/1.368009
J. Appl. Phys. 87 8304 2000 10.1063/1.373542
J. Phys. D: Appl. Phys. 41 035208 2008 10.1088/0022-3727/41/3/035208
Spectrochim. Acta, Part B 62 344 2007 10.1016/j.sab.2007.03.026
Plasma Sources Sci. Technol. 11 525 2002 10.1088/0963-0252/11/4/320
※ AI-Helper는 부적절한 답변을 할 수 있습니다.