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NTIS 바로가기IEEE transactions on electron devices, v.65 no.2, 2018년, pp.419 - 423
Kim, Gun-Hee (School of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, South Korea) , Bae, Hagyoul (School of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, South Korea) , Hur, Jae (School of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, South Korea) , Kim, Choong-Ki (School of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, South Korea) , Lee, Geon-Beom (School of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, South Korea) , Bang, Tewook (SK hynix Inc., Icheon, South Korea) , Son, Yoon-Ik (SK hynix Inc., Icheon, South Korea) , Ryu, Seong-Wan (SK hynix Inc., Icheon, South Korea) , Choi, Yang-Kyu (School of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, South Korea)
A highly biased linear current method (HBLCM) for separately extracting source and drain resistance (
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Hagyoul Bae, Jaeman Jang, Ja Sun Shin, Daeyoun Yun, Jieun Lee, Tae Wan Kim, Dae Hwan Kim, Dong Myong Kim. Modeling and Separate Extraction of Gate-Bias- and Channel-Length-Dependent Intrinsic and Extrinsic Source–Drain Resistances in MOSFETs. IEEE electron device letters : a publication of the IEEE Electron Devices Society, vol.32, no.6, 722-724.
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