초록 ▼

An apparatus useful for the chemical vapor deposition treatment of small parts is provided. The articles to be treated are received upon a frame and the CVD treatment is carried out within a heated receptor, with the deposition material feed line movable for more uniform coating. Immediately subsequ

An apparatus useful for the chemical vapor deposition treatment of small parts is provided. The articles to be treated are received upon a frame and the CVD treatment is carried out within a heated receptor, with the deposition material feed line movable for more uniform coating. Immediately subsequent to the CVD treatment, the coating may be hardened by removing the supporting frame from the still hot receptor by attaching the frame to the movable material feed line. The small parts are now able to be rapidly quenched in freely circulating cooling air.

대표청구항 ▼

An apparatus for the simultaneous chemical vapor deposition treatment of small parts which comprises: a support frame able to retain small parts for treatment; a receptor chamber vertically surrounding and receiving said support frame and having a removable lid portion nesting thereon and attached t

An apparatus for the simultaneous chemical vapor deposition treatment of small parts which comprises: a support frame able to retain small parts for treatment; a receptor chamber vertically surrounding and receiving said support frame and having a removable lid portion nesting thereon and attached to said support frame; a reactor able to receive and surround said receptor and having double outer walls forming an enclosed jacket for said reactor; an induction coil surrounding and adjacent to said reactor for heating said receptor; a cover plate having at least two throughbores and being received by the top portion of said reactor; a gas feed line inserted through one throughbore of said cover plate, forming a vacuum-tight seal therewith, terminating within said reactor with means for both axial and rotational movement within said reactor and communicating with said receptor chamber through an aperture in the removable lid thereof; at least one cooling and cleansing gas lead line inserted and sealed in a separate throughbore of said cover plate; at least two thermal elements placed within said receptor and in close proximity to said support frame, having means for remotely indicating the ambient temperature of said support frame; a support means attached to a portion of said gas feed line lying within said reactor; and a coupling device attached to the removable lid portion of said receptor, able to be received upon and coupled with said support means, whereby the removable lid portion and attached support frame may be withdrawn from said receptor by axial movement of the gas feed line when the coupling device is coupled with said support means.