$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Filtered cathodic arc source 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/32
출원번호 US-0921780 (1992-07-30)
발명자 / 주소
  • Falabella Steven (Livermore CA) Sanders David M. (Livermore CA)
출원인 / 주소
  • as represented by the United States Department of Energy (Washington DC 06)
인용정보 피인용 횟수 : 56  인용 특허 : 0

초록

A continuous, cathodic arc ion source coupled to a macro-particle filter capable of separation or elimination of macro-particles from the ion flux produced by cathodic arc discharge. The ion source employs an axial magnetic field on a cathode (target) having tapered sides to confine the arc, thereby

대표청구항

A method for substantially removing macro-particles produced in a cathodic arc ion source, comprising the steps of: forming a housing having a 45°bend therein; positioning a cathode and a first annular anode in one end of the housing; positioning a second annular anode in an opposite end of said hou

이 특허를 인용한 특허 (56)

  1. Decker Thomas G. ; Lundie Gregory P. ; Pappas David L. ; Welty Richard P. ; Parent C. Robert, Amorphous diamond coating of blades.
  2. Decker Thomas G. ; Lundie Gregory P. ; Pappas David L. ; Welty Richard P. ; Parent C. Robert, Amorphous diamond coating of blades.
  3. Decker Thomas G. ; Lundie Gregory P. ; Pappas David L. ; Welty Richard P. ; Parent C. Robert, Amorphous diamond coating of blades.
  4. Decker Thomas G. ; Lundy Gregory P. ; Pappas David L. ; Welty Richard P. ; Parent C. Robert, Amorphous diamond coating of blades.
  5. Falabella Steven, Amorphous-diamond electron emitter.
  6. Druz, Boris; Aksenov, Ivan I.; Luchaninov, Olexandr A.; Strelnytskiy, Volodymyr E.; Vasylyev, Volodymyr V.; Zaritskiy, Isaak; Sferlazzo, Piero, Apparatus for cathodic vacuum-arc coating deposition.
  7. Ramalingam Subbiah, Apparatus for driving the arc in a cathodic arc coater.
  8. Bardos Ladislav,SEX ; Barankova Hana,SEX, Apparatus for generation of a linear arc discharge for plasma processing.
  9. Beers Russell A. ; Royal Tyrus E., Apparatus for steering the arc in a cathodic arc coater.
  10. Welty,Richard P., Bi-directional filtered arc plasma source.
  11. Xu, Ming Laura, Blade supports for use in shaving systems.
  12. Shi, Xu; Tay, Beng Kang; Tan, Hong Siang; Flynn, David Ian, Cathode arc source with magnetic field generating means positioned above and below the cathode.
  13. Khominich Viktor N., Cathode arc vapor deposition method and apparatus.
  14. Beers Russell A. ; Hendricks Robert E. ; Marszal Dean N. ; Noetzel Allan A. ; Wright Robert J. ; Royal Tyrus E., Cathodic arc vapor deposition apparatus.
  15. Hendricks Robert E. ; Beers Russell A. ; Marszal Dean N. ; Noetzel Allan A. ; Wright Robert J., Cathodic arc vapor deposition apparatus (annular cathode).
  16. Sathrum, Paul Erik, Compact, filtered ion source.
  17. Isak I. Beilis IL; Raymond L Boxman IL; Samuel Goldsmith IL; Michael Keidar ; Hanan Rosenthal IL, Deposition of coatings and thin films using a vacuum arc with a non-consumable hot anode.
  18. Shiina, Yuichi; Watanabe, Iwao, Divided annular rib type plasma processing apparatus.
  19. Weber, Frank; Harris, Samuel, Droplet-free coating systems manufactured by arc-evaporation method.
  20. Ma,Xiaoding; Stirniman,Michael Joseph; Gui,Jing, Dual-layer carbon-based protective overcoats for recording media by filtered cathodic ARC deposition.
  21. Coll Bernard F. ; Menu Eric P. ; Talin Albert Alec, Electron emissive film and method.
  22. Shi, Xu; Tay, Beng Kang; Tan, Hong Siang, Enhanced macroparticle filter and cathode arc source.
  23. Shi,Xu; Tay,Beng Kang; Tan,Hong Siang, Enhanced macroparticle filter and cathode arc source.
  24. Cathey David A. ; Browning Jimmy J. ; Xia Zhong-Yi, Fabrication of field emission array with filtered vacuum cathodic arc deposition.
  25. Brondum, Klaus; Welty, Richard P.; Jonte, Patrick B.; Richmond, Douglas S.; Thomas, Kurt, Faucet.
  26. Brondum, Klaus; Welty, Richard P.; Jonte, Patrick B.; Richmond, Douglas S., Faucet component with coating.
  27. Brondum, Klaus; Welty, Richard P.; Jonte, Patrick B.; Richmond, Douglas S., Faucet component with coating.
  28. Brondum, Klaus; Welty, Richard P.; Jonte, Patrick B.; Richmond, Douglas S., Faucet component with coating.
  29. Brondum, Klaus, Faucet with wear-resistant valve component.
  30. Murakami, Hiroshi; Mikami, Takashi, Film forming apparatus.
  31. Shi, Xu; Tay, Beng Kang; Flynn, David Ian; Tan, Hong Siang; Fulton, Michael, Filtered cathode arc source deposition apparatus.
  32. Gorokhovsky, Vladimir, Filtered cathodic arc deposition method and apparatus.
  33. Gorokhovsky, Vladimir, Filtered cathodic arc deposition method and apparatus.
  34. Gorokhovsky, Vladimir I., Filtered cathodic arc deposition method and apparatus.
  35. Gorokhovsky,Vladimir I., Filtered cathodic arc deposition method and apparatus.
  36. Gorokhovsky,Vladimir I., Filtered cathodic arc deposition method and apparatus.
  37. Shi Xu,SGX ; Flynn David Ian,GBX ; Tay Beng Kang,SGX ; Tan Hong Siang,MYX, Filtered cathodic arc source.
  38. Aksenov,Ivan I.; Strelnytskiy,Volodymyr E.; Vasylyev,Volodymyr V.; Voevodin,Andrey A.; Jones,John G.; Zabinski,Jeffrey S., Filtered cathodic-arc plasma source.
  39. Sathrum, Paul E., Filtered ion source.
  40. Flynn David Ian,GBX ; Shi Xu,SGX ; Tan Hong Siang,MYX ; Tay Beng Kang,SGX, Ignition means for a cathodic arc source.
  41. Knapp, Kenneth E.; Hong, Liubo; Rotmayer, Robert E., Insulator layers for magnetoresistive transducers.
  42. Leu Ming-Sheng,TWX ; Lih Wei-Cheng,TWX ; Lee Yuh-Wen,TWX ; Chen Shau-Yi,TWX ; Chang Wei-Jieh,TWX ; Huang Shinn-Cherng,TWX ; Liou Mau-Shen,TWX, Magnetic apparatus for arc ion plating.
  43. Hadar Ilan,ILX ; Sonnenreich Beni,ILX, Method for making improved long life bonding tools.
  44. Hopwood Jeffrey A. ; Pappas David L., Method of coating edges with diamond-like carbon.
  45. Anders, Andre; MacGill, Robert A., Miniaturized cathodic arc plasma source.
  46. Krause, Stephen E.; Low, Russell J.; Tekletsadik, Kasegn D., Particle trap.
  47. Inaba, Hiroshi; Sasaki, Shinji; Hirano, Shinya; Furusawa, Kenji; Yamasaka, Minoru; Amatatsu, Atsushi; Xu, Shi, Plasma processing apparatus with real-time particle filter.
  48. Inaba, Hiroshi; Sasaki, Shinji; Hirano, Shinya; Furusawa, Kenji; Yamasaka, Minoru; Amatatsu, Atsushi; Xu, Shi, Plasma processing apparatus with real-time particle filter.
  49. Aitchison,Bradley J.; Maula,Jarmo; Leskinen,Hannu; Lang,Teemu; Kuosmanen,Pekka; H?rk?nen,Kari; Sonninen,Martti, Precursor material delivery system for atomic layer deposition.
  50. Dam Chuong Q. ; VanLanen Laura M., Process for reducing particle defects in arc vapor deposition coatings.
  51. Dodonov, Alexander Igorevich; Bashkov, Valery Mikhaylovich, Producing electric arc plasma in a curvilinear plasmaguide and substrate coating.
  52. Welty Richard P., Rectangular filtered arc plasma source.
  53. Miyake, Koji, Vacuum arc vapor deposition apparatus and vacuum arc vapor deposition method.
  54. Miyake, Koji, Vacuum arc vapor deposition apparatus and vacuum arc vapor deposition method.
  55. Brondum, Klaus; Welty, Richard P.; Richmond, Douglas S.; Jonte, Patrick B.; Thomas, Kurt, Valve component for faucet.
  56. Brondum, Klaus; Welty, Richard P.; Richmond, Douglas S.; Jonte, Patrick B.; Thomas, Kurt, Valve component for faucet.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로