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Rectangular filtered arc plasma source 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/32
출원번호 US-0291455 (1999-04-14)
발명자 / 주소
  • Welty Richard P.
출원인 / 주소
  • Vapor Technologies, Inc.
대리인 / 주소
    Kapustij
인용정보 피인용 횟수 : 9  인용 특허 : 51

초록

An apparatus is disclosed for generating oppositely directed streams of plasma for the purpose of depositing a coating or performing ion processing. The plasma comprises ionized vapor of a cathode material, generated by vacuum arc evaporation from a linear magnetron cathode. The plasma is diverted b

대표청구항

[ What I claim is:] [1.] An apparatus for generating oppositely directed plasma streams comprising ionized vapor of a cathode material, said apparatus comprising cathode means, filter means, magnetic means, arc power supply means, and anode means; said apparatus having oppositely facing output apert

이 특허에 인용된 특허 (51)

  1. Welty Richard P. (Boulder CO), Apparatus and method for coating a substrate using vacuum arc evaporation.
  2. Gorokhovsky Vladimir I. (10 Stonedene Blvd. Willowdale ; Ontario CAX M2R 3C7), Apparatus for application of coatings in vacuum.
  3. Gorokhovsky Vladimir I. (2 Laxton Avenue ; Apartment 212 Toronto ; Ontario CAX M6K 1K9 ), Arc assisted CVD coating and sintering method.
  4. Hanaguri Koji,JPX ; Tsuji Kunihiko,JPX ; Nomura Homare,JPX ; Tamagaki Hiroshi,JPX ; Kawaguchi Hiroshi,JPX ; Shimojima Katsuhiko,JPX ; Fujii Hirofumi,JPX ; Kido Toshiya,JPX ; Suzuki Takeshi,JPX ; Inou, Arc ion plating device and arc ion plating system.
  5. Axenov Ivan I. (ulitsa Valtera ; 21-a ; kv. 45 Kharkov SUX) Belous Vitaly A. (ulitsa Svetlaya ; 21 ; kv. 250 Kharkov SUX) Padalka Valentin G. (ulitsa Danilevskogo ; 10 ; kv. 122 Kharkov SUX) Khoroshi, Arc plasma generator and a plasma arc apparatus for treating the surfaces of work-pieces, incorporating the same arc pla.
  6. Martin Philip J. (New South Wales AUX) Netterfield Roger P. (New South Wales AUX) Kinder Terence J. (New South Wales AUX), Arc source macroparticle filter.
  7. Veltrop Hans (Grubbenvorst NLX) Wesemeyer Harald (Wiehl NLX) Buil Boudewijn J. A. M. (Belfeld NLX), Cathode arc discharge evaporating device.
  8. Chambers Douglas L. (Nashville TN) Wan Chong T. Wan (Nashville TN), Cathode for sputtering.
  9. Storer Jonathan G. (Mendota Heights MN) Benson Martin H. (Shoreview MN) Kieschke Robert R. (Woodbury MN), Cathodic arc coating apparatus and method.
  10. Goldberg Jerry (462 Arbor Cir. Youngstown OH 44505), Construction mat formed from discarded tire beads and method for its use.
  11. Sablev Leonid P. (Kharkov UAX) Andreev Anatoly A. (Kharkov UAX) Crigoriev Sergei N. (Moscow RUX), Electric arc metal evaporator.
  12. Penfold Alan S. (Playa del Rey CA) Thornton John A. (Los Angeles CA), Electrode type glow discharge apparatus.
  13. Dasgupta Purnendu (Lubbock TX) Li-Yuan Bao (Lubbock TX), Electrophoresis with chemically suppressed detection.
  14. Mularie William M. (Stillwater MN), Evaporation arc stabilization.
  15. Kubo Seitoku (Toyota JPX) Kuramochi Koujiro (Okazaki JPX) Kyushima Tatsuo (Toyota JPX), Fail safe automatic transmission lock up clutch control system.
  16. Falabella Steven (Livermore CA) Sanders David M. (Livermore CA), Filtered cathodic arc source.
  17. Hsu Jon S. (Taipei TWX), In-plane parallel bias magnetic field generator for sputter coating magnetic materials onto substrates.
  18. Fournier Paul R. (1027 San Andres #2 Santa Barbara CA 93101), Integrated sputtering apparatus and method.
  19. Inuishi Noriyuki (Takasago JPX) Kumakiri Tadashi (Takasago JPX) Akari Kouichirou (Takasago JPX) Munemasa Jun (Takasago JPX), Ion implantation apparatus.
  20. Sanders David M. (Livermore CA) Falabella Steven (Livermore CA), Ion source based on the cathodic arc.
  21. Treglio James R. (San Diego CA), Magnetically-filtered cathodic arc plasma apparatus.
  22. Hartig Klaus (Brighton MI) Dietrich Anton (Liechtenstein DEX) Szczyrbowski Joachim (Goldbach DEX), Magnetron cathode for a rotating target.
  23. Kieser Jrg (Albstadt DEX) Kukla Reiner (Hanau DEX) Deppisch Gerd (Aschaffenburg DEX), Magnetron cathode for cathodic evaportion apparatus.
  24. Altshuler Alexander (Pawtucket RI), Magnetron cathode sputtering method and apparatus.
  25. Bernardet Henri (Saint Michel sur Orge FRX) Thiebaut Chantal (Villiers sur Marne FRX), Metal ion implantation apparatus.
  26. Lefkow Anthony R. T. (Worthington OH), Method and apparatus for evaporation arc stabilization for non-permeable targets utilizing permeable stop ring.
  27. Mularie, William M., Method and apparatus for evaporation arc stabilization for permeable targets.
  28. Morrison ; Jr. Charles F. (Boulder CO), Method and apparatus for evaporation arc stabilization including initial target cleaning.
  29. George Carroll H. (Norwood NY) Rust Ray D. (Berkeley Heights NJ), Method and apparatus for feeding and coating articles in a controlled atmosphere.
  30. Hurwitt Steven, Method and apparatus for forming a magnetically oriented thin film.
  31. Buhl Rainer (Sargans CHX) Hasler Christoph (Azmoos CHX), Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices.
  32. Daube Christoph (Frankfurt DEX) Kopacz Uwe (Hainburg DEX) Schulz Siegfried (Hanau DEX), Method for coating components or shapes by cathode sputtering.
  33. Nago Kumio (Ikoma JPX) Aokura Isamu (Osaka JPX) Yamanishi Hitoshi (Osaka JPX) Osano Koichi (Osaka JPX) Sakakima Hiroshi (Kyoto JPX) Suemitsu Toshiyuki (Minoh JPX), Method for making soft magnetic film.
  34. Latz Rudolf (Rodgau DEX) Gesche Roland (Seligenstadt DEX), Microwave-enhanced sputtering configuration.
  35. Helmer John C. (260 S. Balsamina Way Palo Alto CA 94028) Lai Kwok F. (959 Van Auken Cir. Palo Alto CA 94303) Anderson Robert L. (3169 Emerson Palo Alto CA 94306), Physical vapor deposition employing ion extraction from a plasma.
  36. Parsons Robert R. (Vancouver CAX) McMahon Richard (Vancouver CAX) Thewalt Michael L. (Vancouver CAX), Planar magnetron sputtering device.
  37. Manley Barry W. (Boulder CO), Planar magnetron sputtering magnet assembly.
  38. Kljuchko Gennady V. (prospekt Kurchatova ; 27 ; kv. 68 Kharkov SUX) Padalka Valentin G. (ulitsa Danilevskogo ; 10 ; kv. 122 Kharkov SUX) Sablev Leonid P. (ulitsa P. Morozova ; 3 ; kv. 3 Kharkov SUX) , Plasma arc apparatus for applying coatings by means of a consumable cathode.
  39. Bergmann Erich (Mels CHX) Hummer Elmar (Satteins ATX), Process for depositing layers on substrates in a vacuum chamber.
  40. Henshaw William F. (10530 Greene Dr. Lorton VA 22079), Rectangular cavity magnetron sputtering vapor source.
  41. Welty Richard P., Rectangular vacuum-arc plasma source.
  42. Welty Richard P. (Boulder CO), Rectangular vacuum-arc plasma source.
  43. Berg Lloyd (1314 S. 3rd Ave. Bozeman MT 59715), Separation of tetrachloroethylene from a butyl alcohol by extractive distillation.
  44. Class Walter H. (Yonkers NY) Hurwitt Steven D. (Park Ridge NJ) I Lin (Piermont NY), Shaped field magnetron electrode.
  45. Sichmann Eggo (Gelnhausen DEX), Sputtering cathode.
  46. Geisler Michael (Wchtersbach DEX) Kieser Jrg (Albstadt DEX) Kukla Reiner (Hanau DEX), Sputtering cathode based on the magnetron principle.
  47. Kukla Reiner (Hanau DEX) Sichmann Eggo (Gelnhausen DEX) Fritsche Wolf-Eckart (Kleinostheim DEX), Sputtering cathode for coating substrates in cathode sputtering apparatus.
  48. Yamanishi Hitoshi (Higashiosaka JPX) Aokura Isamu (Osaka JPX) Suemitsu Toshiyuki (Mino JPX) Takisawa Takahiro (Moriguchi JPX), Sputtering electrode.
  49. Love ; Robert Bruce ; Bowen ; Alan W., Two-sided planar magnetron sputtering apparatus.
  50. Gorokhovsky Vladimir I. (10 Stonedene Blvd. Willowdale ; Ontario CAX M2R 3C7), Vacuum-arc plasma source.
  51. Painton Richard C. (Webster NY) Marchetti Jay D. (Rochester NY) Acello John J. (East Rochester NY) Bradley John J. (Rochester NY) Bolton Richard H. (East Rochester NY), Video player with power-down capability.

이 특허를 인용한 특허 (9)

  1. Takigawa, Shirou; Nose, Kouichi; Koizumi, Yasuhiro; Hori, Takanobu; Miya, Yukio, Arc evaporator, method for driving arc evaporator, and ion plating apparatus.
  2. Welty,Richard P., Bi-directional filtered arc plasma source.
  3. Gorokhovsky, Vladimir I., Filtered cathodic arc deposition method and apparatus.
  4. Gorokhovsky,Vladimir I., Filtered cathodic arc deposition method and apparatus.
  5. Gorokhovsky,Vladimir I., Filtered cathodic arc deposition method and apparatus.
  6. Richard P. Welty, Linear magnetron arc evaporation or sputtering source.
  7. Gorokhovsky, Vladimir I., Rectangular cathodic arc source and method of steering an arc spot.
  8. Gorokhovsky, Vladimir, Rectangular filtered vapor plasma source and method of controlling vapor plasma flow.
  9. Kolpakov, Alexandr Yakovlevich; Inkin, Vitaly Nikolaevich; Kirpilenko, Grigory Grigorievich, Vacuum coating apparatus.
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