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Method for forming polycrystalline silicon from the crystallization of microcrystalline silicon 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-031/02
출원번호 US-0812580 (1997-03-07)
발명자 / 주소
  • Voutsas Tolis
출원인 / 주소
  • Sharp Kabushiki Kaisha, JPX
대리인 / 주소
    Maliszewski
인용정보 피인용 횟수 : 29  인용 특허 : 0

초록

A method is provided of fabricating a thin film transistor semiconductor film of polycrystalline silicon on a transparent substrate suitable for the manufacture of a liquid crystal display. A film of substantially amorphous silicon is placed on the transparent substrate. Suspended in the amorphous s

대표청구항

[ What is claimed is:] [1.] In forming a polycrystalline film from a microcrystalline film, a method comprising the steps of:a) depositing a microcrystalline film including the following:i) amorphous matter having a thickness of less than approximately 500 .ANG.; andii) microcrystallites embedded in

이 특허를 인용한 특허 (29)

  1. Park, Ji-Yong; Park, Hye-Hyang, Fabrication method for polycrystalline silicon thin film and apparatus using the same.
  2. Yamazaki, Shunpei, Light-emitting device.
  3. Yamazaki, Shunpei, Light-emitting device.
  4. Yamazaki, Shunpei, Light-emitting device.
  5. Wang,Qi; Iwaniczko,Eugene, Method and apparatus for fabricating a thin-film solar cell utilizing a hot wire chemical vapor deposition technique.
  6. Yeh, Wen-Chang, Method for fabricating a polycrystalline silicon film.
  7. Mitsutoshi Miyasaka JP, Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and a method for fabricating solar cells and active matrix liquid crystal devices.
  8. Miyasaka, Mitsutoshi, Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and a method for fabricating solar cells and active matrix liquid crystal devices.
  9. Miyasaka Mitsutoshi,JPX, Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and method for fabricating solar cells and active matrix liquid crystal devices.
  10. Miyairi, Hidekazu; Jinbo, Yasuhiro; Nei, Kosei, Method for manufacturing display device.
  11. Sasaki Hideyuki,JPX ; Oose Michihiro,JPX ; Suzuki Isao,JPX ; Takeno Shiro,JPX ; Tomita Mitsuhiro,JPX ; Kawakyu Yoshito,JPX ; Matsuura Yuki,JPX ; Mitsuhashi Hiroshi,JPX, Method for manufacturing polycrystal semiconductor film.
  12. Voutsas Tolis, Method of optimizing crystal grain size in polycrystalline silicon films.
  13. Chih-Yu Peng TW; In-Cha Hsieh TW, Method of patterning an ITO layer.
  14. Stoddard, Nathan G., Methods and apparatus for manufacturing monocrystalline cast silicon and monocrystalline cast silicon bodies for photovoltaics.
  15. Stoddard, Nathan G.; Clark, Roger F., Methods and apparatuses for manufacturing cast silicon from seed crystals.
  16. Stoddard, Nathan G., Methods and apparatuses for manufacturing geometric multicrystalline cast silicon and geometric multicrystalline cast silicon bodies for photovoltaics.
  17. Stoddard, Nathan G., Methods and apparatuses for manufacturing monocrystalline cast silicon and monocrystalline cast silicon bodies for photovoltaics.
  18. Wu, YewChung Sermon; Hou, Chih Yuan; Hu, Guo Ren; Liu, Po Chih, Methods for fabricating polysilicon film and thin film transistors.
  19. Stoddard, Nathan G., Methods for manufacturing geometric multi-crystalline cast materials.
  20. Stoddard, Nathan G., Methods for manufacturing monocrystalline or near-monocrystalline cast materials.
  21. Marc Berenguer FR; Roderick Devine FR, Process for depositing a Ta2O5 dielectric layer.
  22. Stradins, Pauls; Wang, Qi, Rapid thermal processing by stamping.
  23. Hara Akito,JPX ; Murakami Satoshi,JPX ; Kitahara Kuninori,JPX, Semiconductor device with polysilicon layer of good crystallinity and its manufacture method.
  24. Hanna, Junichi; Suzumura, Isao; Matsumura, Mieko; Hatano, Mutsuko; Onisawa, Kenichi; Wakagi, Masatoshi; Nishimura, Etsuko; Kagatsume, Akiko, Semiconductor device, manufacturing method thereof, and display apparatus using the semiconductor device.
  25. Yamanaka,Hideo, Semiconductor thin film forming method, production methods for semiconductor device and electrooptical device, devices used for these methods, and semiconductor device and electrooptical device.
  26. Kawashima, Takahiro; Nishitani, Hikaru; Ootaka, Sei, Semiconductor thin-film forming method, semiconductor device, semiconductor device manufacturing method, substrate, and thin-film substrate.
  27. Voutsas, Apostolos T.; Hartzell, John W., System and method for forming single-crystal domains using crystal seeds.
  28. Park, Wang Jun; Kim, Jung Bae; Ahn, Young Jae; Kim, Hyoung June; Shin, Dong Hoon, System for heat treatment of semiconductor device.
  29. Crowder,Mark A.; Voutsas,Apostolos T.; Adachi,Masahiro, Thin film structure from LILAC annealing.
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