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[미국특허] High purity opaque silica glass 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03C-003/06
  • C03C-004/08
  • C03C-011/00
출원번호 US-0977887 (1997-11-25)
발명자 / 주소
  • Sato Tatsuhiro,JPX
  • Fujinoki Akira,JPX
  • Inaki Kyoichi,JPX
  • Yoshida Nobumasa,JPX
  • Yokota Tohru,JPX
출원인 / 주소
  • Shin-Etsu Quartz Products Co., Ltd., JPX
대리인 / 주소
    Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
인용정보 피인용 횟수 : 16  인용 특허 : 14

초록

Opaque silica glass having a density of 2.0 to 2.18 g/cm.sup.3, sodium and potassium elements concentrations in the silica glass of each 0.5 ppm or less and an OH group concentration of 30 ppm or less, and containing bubbles which are independent bubbles having the following physical values: a bubbl

대표청구항

[ What is claimed is:] [1.] A high purity opaque silica glass containing silica and having a density of from 2.0 to 2.18 g/cm.sup.3, wherein the concentration of each of sodium and potassium elements contained therein is 0.5 ppm or less, the concentration of OH groups contained therein is 30 ppm or

이 특허에 인용된 특허 (14)

  1. Brown David R. (Beverly MA) Frost ; Jr. Charles E. (Exeter NH) White Kenneth A. (Raymond NH), Apparatus for making quartz glass crucibles.
  2. Nakashima Tadao (Miyazaki JPX) Shimizu Masataka (Miyazaki JPX) Kawano Mikio (Miyazaki JPX), Articles of porous glass and process for preparing the same.
  3. Vieli Otto A. (Rhzns CHX), Foamed granular glass.
  4. Vieli Otto A. (Rhzns CHX), Granulated foamed glass and process for the production thereof.
  5. Kamo Kenji (Tsukuba JPX) Ono Kouichi (Tsuchiura JPX) Tsukuma Koji (Tsuchiura JPX) Nagata Hiroya (Tsuchiura JPX) Abe Emiko (Yamagata JPX) Kikuchi Yoshikazu (Sagae JPX) Funakoshi Yushiharu (Yamagata JP, High-purity, opaque quartz glass, method for producing same and use thereof.
  6. Matsumura Mitsuo (Takefu JPX) Matsui Hiroshi (Takefu JPX), Manufacture of quartz glass crucible for use in the manufacture of single crystal silicon.
  7. Meerman Wilhelmus C. P. M. (Eindhoven NLX), Method of densifying a preformed porous body of a material the main constituent of which is SiO2.
  8. Rohatyn Pierre (Le Roc 30130 St. Alexandre FRX), Method of making glass forming molds of an amorphous fused silica composition.
  9. Brning Rolf (Bruchkbel DEX) Habegger Friedhelm (Hammersbach DEX), Method of making quartz glass crucibles, and apparatus carrying out the method.
  10. Wada Keisuke (Yokohama JPX) Tsurita Yasushi (Machida JPX), Porous glass and process for its production.
  11. Wada Keisuke (Yokohama JPX) Tsurita Yasushi (Tokyo JPX), Porous glass and process for its production.
  12. Elmer Thomas H. (Corning NY), Process for dewatering porous glass.
  13. Loritsch Kenneth B. (Asheville NC) James Robert D. (Asheville NC), Purified quartz and process for purifying quartz.
  14. Loxley ; Ted A. ; Barber ; Walter G. ; Combs ; Walter W. ; Webb ; John M ., Vacuum process for avoiding devitrification damage to transparent slip-cast silica crucibles.

이 특허를 인용한 특허 (16)

  1. Weber, Juergen; Sato, Tatsuhiro; Schneider, Ralf; Hofmann, Achim; Gebauer, Christian, Component of quartz glass for use in semiconductor manufacture and method for producing the same.
  2. Yuan, Jie; Sun, Jennifer Y.; Duan, Renguan, Erosion resistance enhanced quartz used in plasma etch chamber.
  3. Yamada Nobusuke,JPX ; Hashimoto Shinkichi,JPX ; Tsukuma Koji,JPX ; Akiyama Tomoyuki,JPX ; Kikuchi Yoshikazu,JPX ; Segawa Hideaki,JPX, High purity transparent silica glass.
  4. Weber, Juergen; Pogge, Tobias; Trommer, Martin; Kuehn, Bodo; Kirst, Ulrich; Werdecker, Waltraud, Holder made from quartz glass for the processing of semiconductor wafers and method for production of the holder.
  5. Ohama, Yasuo; Matsui, Hiroshi, Method for producing quartz glass crucible for use in pulling silicon single crystal and quartz glass crucible produced by said method.
  6. Vaynberg,Boris; Zimmerman,Yotam; Iger,Yoni; Aharonowitz,Gal, Method, a system, and a device for detecting and for reducing energy leakage from an energy treatment devices.
  7. Kimbel, Steven L.; Korb, Harold W.; Phillips, Richard J.; Rathod, Shailendra B., Methods for producing crucibles with a reduced amount of bubbles.
  8. Kimbel, Steven L.; Korb, Harold W.; Phillips, Richard J.; Rathod, Shailendra B., Methods for producing crucibles with a reduced amount of bubbles.
  9. Hughes, Iain Allan; Baig, Arif Ali; Deckner, George Endel, Mild oral care compositions.
  10. Deckner, George Endel; Baig, Arif Ali; Hughes, Iain Allan; Haught, John Christian, Oral care compositions comprising fused silica.
  11. Baig, Arif Ali; Deckner, George Endel; Hughes, Iain Allan; Kincaid, Erica Marie, Oral care compositions with fused silica.
  12. Haught, John Christian; Deckner, George Endel; Baig, Arif Ali; Hughes, Iain Allan, Prophy paste and weekly oral care compositions.
  13. Dawes, Steven Bruce; Jennings, Douglas H, Refractory vessels and methods for forming same.
  14. Watanabe, Yukimune, Semiconductor substrate and method for producing semiconductor substrate.
  15. Deckner, George Endel; Baig, Arif Ali; Haught, John Christian; Hughes, Iain Allan, Sensitivity oral care compositions.
  16. Baig, Arif Ali; Deckner, George Endel; Hughes, Iain Allan, Whitening composition with fused silica.
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