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Semiconductor device-based sensors 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-023/58
출원번호 US-0879704 (2004-06-28)
등록번호 US-7361946 (2008-04-22)
발명자 / 주소
  • Johnson,Jerry W.
  • Piner,Edwin L.
  • Linthicum,Kevin J.
출원인 / 주소
  • Nitronex Corporation
대리인 / 주소
    Wolf, Greenfield & Sacks, P.C.
인용정보 피인용 횟수 : 51  인용 특허 : 84

초록

Semiconductor device-based chemical sensors and methods associated with the same are provided. The sensors include regions that can interact with chemical species being detected. The chemical species may, for example, be a component of a fluid (e.g., gas or liquid). The interaction between the chemi

대표청구항

What is claimed is: 1. A FET-based chemical sensor designed to detect a chemical species comprising: a semiconductor material region comprising a gallium nitride material layer; a source electrode formed on the semiconductor material region; a drain electrode formed on the semiconductor material re

이 특허에 인용된 특허 (84)

  1. Smith, Richard Peter, Aluminum gallium nitride/gallium nitride high electron mobility transistors having a gate contact on a gallium nitride based cap segment.
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  9. Nakamura Shuji (Anan JPX), Crystal growth method for gallium nitride-based compound semiconductor.
  10. Edmond John A. ; Kong Hua-Shuang, Double heterojunction light emitting diode with gallium nitride active layer.
  11. Edmond John A. ; Kong Hua-Shuang, Double heterojunction light emitting diode with gallium nitride active layer.
  12. Hughes Robert C. (Albuquerque NM) Schubert W. Kent (Albuquerque NM), Extended range chemical sensing apparatus.
  13. David Kapolnek ; Brian Thibeault, Fabrication of semiconductor materials and devices with controlled electrical conductivity.
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  37. Redwing Joan ; Tischler Michael A., High brightness electroluminescent device emitting in the green to ultraviolet spectrum and method of making the same.
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  40. Parsons, James D., High temperature circuit structures with expansion matched SiC, AlN and/or AlxGa1-xN(x>0.69) circuit device.
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  43. Cole Melanie ; Xie Kezhou, Low defect density gallium nitride epilayer and method of preparing the same.
  44. Edmond John Adam ; Bulman Gary E. ; Kong Hua-Shuang, Low-strain laser structures with group III nitride active layers.
  45. Sohn Byung Ki (425-4 Chung-dong ; Suseong-ku ; Taegu KRX), Measuring circuit with a biosensor utilizing ion sensitive field effect transistors.
  46. Moustakas Theodore D. (Dover MA) Molnar Richard J. (Medford MA), Method for epitaxially growing gallium nitride layers.
  47. Yu Zhiyi ; Wang Jun ; Droopad Ravindranath ; Ramdani Jamal, Method for fabricating a semiconductor structure having a stable crystalline interface with silicon.
  48. Chung Young Sir (Gilbert AZ) Evans Keenan L. (Tempe AZ) Hughes Henry G. (Scottsdale AZ) Gutteridge Ronald J. (Paradise Valley AZ), Method for forming a semiconductor sensor FET device.
  49. Koide Norikatsu,JPX, Method for manufacturing gallium nitride compound semiconductor.
  50. Lo Yu-Hwa ; Ejeckam Felix, Method for producing high quality heteroepitaxial growth using stress engineering and innovative substrates.
  51. Henryk Temkin ; Sergey A. Nikishin, Method of epitaxial growth of high quality nitride layers on silicon substrates.
  52. Takeuchi Tetsuya (Nijigaokahigashidanchi Room No. 19-103 ; No. 21 ; Kamioka-cho 2-chome ; Meito-ku Nagoya JPX) Amano Hiroshi (Nijigaokahigashidanchi Room No. 19-103 ; No. 21 ; Kamioka-cho 2-chome ; M, Method of fabricating a gallium nitride based semiconductor device with an aluminum and nitrogen containing intermediate.
  53. Zhang, Xiong; Chua, Soo Jin, Method of fabricating group-III nitride-based semiconductor device.
  54. Yuri Masaaki,JPX ; Ueda Tetsuzo ; Baba Takaaki, Method of forming gallium nitride crystal.
  55. Ramdani Jamal ; Lebby Michael S. ; Holm Paige M., Method of growing gallium nitride on a spinel substrate.
  56. Terashima Kazutaka,JPX ; Nishimura Suzuka,JPX ; Tsuzaki Takuji,JPX ; Udagawa Takashi,JPX, Method of growing group III nitride semiconductor crystal layer and semiconductor device incorporating group III nitride semiconductor crystal layer.
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  58. Khan Muhammad A. (White Bear Lake MN) VanHove James M. (Eagan MN) Kuznia Jon N. (Fridley MN) Olson Donald T. (Circle Pines MN), Method of making a high electron mobility transistor.
  59. Mishra, Umesh Kumar; Keller, Stacia, Method to reduce the dislocation density in group III-nitride films.
  60. Holm-Kennedy James W. (3215 Pacific Heights Honolulu HI 96813), Methods and devices for enhanced biochemical sensing.
  61. Smith, Richard Peter, Methods of fabricating aluminum gallium nitride/gallium nitride high electron mobility transistors having a gate contact on a gallium nitride based cap segment.
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  69. Sheppard, Scott Thomas; Allen, Scott Thomas; Palmour, John Williams, Nitride based transistors on semi-insulating silicon carbide substrates.
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  71. Gehrke, Thomas; Linthicum, Kevin J.; Davis, Robert F., Pendeoepitaxial methods of fabricating gallium nitride semiconductor layers on sapphire substrates.
  72. Kevin J. Linthicum ; Thomas Gehrke ; Robert F. Davis, Pendeoepitaxial methods of fabricating gallium nitride semiconductor layers on weak posts, and gallium nitride semiconductor structures fabricated thereby.
  73. Johnson Curtis C. (Sandy UT) Moss Stanley D. (Kaysville UT) Janata Jiri A. (Salt Lake City UT), Selective chemical sensitive FET transducers.
  74. Haas Juergen (Meersburg DEX) Plog Carsten (Markdorf DEX), Selective gas sensor.
  75. Kensuke Kasahara JP; Yasuo Ohno JP; Masaaki Kuzuhara JP; Hironobu Miyamoto JP; Yuji Ando JP; Tatsuo Nakayama JP; Kazuaki Kunihiro JP; Nobuyuki Hayama JP; Yuji Takahashi JP; Kouji Matsunaga , Semiconductor device.
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  81. Ramdani, Jamal; Hilt, Lyndee L., Semiconductor structure including a compliant substrate having a graded monocrystalline layer and methods for fabricating the structure and semiconductor devices including the structure.
  82. Solomon Glenn S., Thermal mismatch compensation to produce free standing substrates by epitaxial deposition.
  83. Edmond John A. (Cary NC) Bulman Gary E. (Cary NC) Kong Hua-Shuang (Raleigh NC) Dmitriev Vladimir (Fuquay-Varina NC), Vertical geometry light emitting diode with group III nitride active layer and extended lifetime.
  84. Furushima Yuji,JPX, light emitting semiconductor device and its manufacturing method.

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  20. Therrien, Robert J.; Johnson, Jerry W.; Hanson, Allen W., Gallium nitride material devices including conductive regions and methods associated with the same.
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  22. Piner, Edwin L.; Roberts, John C.; Rajagopal, Pradeep, Gallium nitride materials and methods associated with the same.
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