초록 ▼

A method of responding to voltage or current transients during processing of a wafer in a plasma reactor at each of plural RF power applicators and at the wafer support surface. For each process step and for each of the power applicators and the wafer support surface, the method includes determining

A method of responding to voltage or current transients during processing of a wafer in a plasma reactor at each of plural RF power applicators and at the wafer support surface. For each process step and for each of the power applicators and the wafer support surface, the method includes determining an arc detection threshold lying above a noise level. The method further includes comparing each transient with the threshold determined for the corresponding power applicator or wafer support surface, and issuing an arc detect flag if the transient exceeds the threshold.

대표청구항 ▼

The invention claimed is: 1. In a plasma reactor comprising a chamber with plural plasma power applicators and plural power generators coupled to said power applicators and a workpiece support pedestal with a workpiece support surface, a method of monitoring arcing in said chamber, comprising: carr

The invention claimed is: 1. In a plasma reactor comprising a chamber with plural plasma power applicators and plural power generators coupled to said power applicators and a workpiece support pedestal with a workpiece support surface, a method of monitoring arcing in said chamber, comprising: carrying out a plasma process in accordance with a process recipe comprising a succession of process steps; monitoring voltage or current transients at each of said power applicators and at said workpiece support surface; for each of at least respective ones of said process steps and for each of at least respective ones of said power applicators and said workpiece support surface, determining an arc detection threshold lying above a noise level; comparing each transient with the threshold determined for the corresponding power applicator or workpiece support surface, and issuing an arc detect flag if said transient exceeds said threshold, said arc detect flag being associated with one of said power generators or said workpiece support surface; determining the identity or location of the power applicator or workpiece support surface for which a corresponding threshold value was exceeded by a transient, and displaying said identity or location at a user interface; turning off said plural power generators in response to said arc flag; and wherein: said plural power applicators comprise a sputter target at a ceiling of the reactor, and a coil antenna at a side wall of said reactor; and said plural power generators comprise a first power generator coupled to said target, a second power generator coupled to said coil antenna and a third power generator coupled to the electrode of said workpiece support pedestal. 2. The method of claim 1 wherein said displaying comprises identifying a consumable in said chamber associated with said arc flag. 3. The method of claim 1 wherein: if said flag is associated with the power applicator comprising said target, said identifying a consumable comprises identifying said target as requiring replacement. 4. The method of claim 1 wherein: if said flag is associated with the power applicator comprising said coil antenna, said identifying a consumable comprises identifying said coil antenna as requiring replacement. 5. The method of claim 1 wherein: if said flag is associated with the power applicator comprising said workpiece support pedestal electrode, said identifying a consumable comprises identifying a process ring surrounding said workpiece support pedestal as requiring replacement. 6. In a plasma reactor comprising a chamber with plural plasma power applicators and plural power generators coupled to said power applicators, and a workpiece support pedestal with a workpiece support surface, a method of monitoring arcing in said chamber, comprising: carrying out a plasma process in accordance with a process recipe comprising a succession of process steps under control of a process controller; monitoring voltages or currents with respective sensors coupled to said power applicators and to said workpiece support pedestal; for each of at respective ones of said process steps and for each of at least respective ones of said sensors, determining an arc detection threshold lying above a noise level; comparing in respective arc detect comparators the output of the respective sensor with the threshold determined for the respective sensor, and issuing an arc detect flag if said output exceeds said threshold; determining the location of the sensor for which a corresponding arc detect flag was generated, and displaying said location at a user interface; turning off said power generators in response to said arc flag; wherein said reactor further comprises a local area network having a plurality of ports, said controller linked to one of said ports, said generators comprising interfaces linked to respective ones of said ports and identified with respective device addresses, said method further comprising: linking each of said comparators to other respective ones of said ports and assigning each said comparator with a respective unique device address. 7. The method of claim 6 further comprising programming said controller to download said thresholds for successive process steps to respective ones of said comparators over said local area network. 8. The method of claim 7 further comprising programming said controller to receive arc flags from said comparators and effect shut down of said generators over said local area network. 9. The method of claim 8 further comprising programming said controller to identify arc flag locations based upon a device address contained in an arc flag received over said local area network. 10. The method of claim 9 wherein said displaying comprises identifying a consumable in said chamber associated with said arc flag. 11. The method of claim 10 wherein: said power applicators comprise a sputter target at a ceiling of the reactor, a coil antenna at a side wall of said reactor and an electrode of the workpiece support pedestal; said power generators comprise a first power generator coupled to said target, a second power generator coupled to said coil antenna and a third power generator coupled to an electrode of said workpiece support pedestal. 12. The method of claim 11 wherein: if said flag is associated with the power applicator comprising said target, said identifying a consumable comprises identifying said target as requiring replacement. 13. The method of claim 11 wherein: if said flag is associated with the power applicator comprising said coil antenna, said identifying a consumable comprises identifying said coil antenna as requiring replacement. 14. The method of claim 11 wherein: if said flag is associated with the power applicator comprising said electrode, said identifying a consumable comprises identifying a process ring surrounding said workpiece support pedestal as requiring replacement. 15. The method of claim 6 wherein said reactor further comprises a digital input/output (DIO) network comprising respective channels dedicated to communication from respective DIO sensor relays to said controller and respective channels dedicated to communication from said controller to respective power generators of said reactor, said method further comprising: coupling outputs of respective ones of said comparators to respective ones of said sensor relays. 16. The method of claim 6 wherein said reactor comprises a series interlock electrical circuit comprising relays coupled to sense interruption of respective safety connections and power generator interlock for disabling respective ones of said power generators upon interruption of said interlock series circuit, said method further comprising: coupling outputs of respective ones of said comparators to respective ones of said relays.