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An MOCVD reactor such as a rotating disc reactor (10) is equipped with a gas injector head having diffusers (129) disposed between adjacent gas inlets. The diffusers taper in the downstream direction. The injector head desirably has inlets (117) for a first gas such as a metal alkyl disposed in radi

An MOCVD reactor such as a rotating disc reactor (10) is equipped with a gas injector head having diffusers (129) disposed between adjacent gas inlets. The diffusers taper in the downstream direction. The injector head desirably has inlets (117) for a first gas such as a metal alkyl disposed in radial rows which terminate radially inward from the reactor wall to minimize deposition of the reactants on the reactor wall. The injector head desirably also has inlets (125) for a second gas such as ammonia arranged in a field between the rows of first gas inlets, and additionally has a center inlet (135) for the second gas coaxial with the axis of rotation.

대표청구항 ▼

1. A method of treating one or more substrates comprising: (a) rotating a holder carrying the substrates about an axis while maintaining surfaces of the substrates substantially perpendicular to the axis and facing in an upstream direction along the axis; and, during the rotating step,(b) dischargin

1. A method of treating one or more substrates comprising: (a) rotating a holder carrying the substrates about an axis while maintaining surfaces of the substrates substantially perpendicular to the axis and facing in an upstream direction along the axis; and, during the rotating step,(b) discharging a first gas in the downstream direction toward the substrates as a first gas stream extending across the axis in a first radial direction perpendicular to the axis and as a second gas stream extending perpendicular to the axis in a second radial direction perpendicular to the first radial direction;(c) simultaneously discharging a second gas in the downstream direction toward the substrates as third gas streams disposed around the axis between the first and second gas streams; and(d) discharging the second gas in the downstream direction toward the substrates from a center inlet disposed substantially on the axis. 2. A method as claimed in claim 1 further comprising controlling the discharge of the second gas from the center inlet independently of the discharge of the third gas streams. 3. A method as claimed in claim 1, wherein the first and second gas streams extend to a first radial distance from the axis, and the third gas streams extend to a second radial distance from the axis greater than the first radial distance. 4. A method as claimed in claim 3 wherein the first and second gas streams are discharged from first and second rows of first gas inlets arranged perpendicular to each other and perpendicular to the axis, and the third gas streams are discharged from gas field inlets disposed around the axis between the first and second rows of first gas inlets. 5. A method as claimed in claim 4, wherein the discharging steps are performed via an injector head having a perimeter and a series of the first gas inlets and the gas field inlets, a center of the injector head being coaxial with the axis, and wherein the first gas inlets are arranged between the center and the first radial distance, and the gas field inlets are disposed between the center and the second radial distance, at least some gas field inlets being situated between the first and the second radial distance. 6. A method as claimed in claim 4, further comprising arranging the gas field inlets into a plurality of zones, and regulating an amount of the second gas discharged from at least a first of the plurality of zones independently of an amount of the second gas discharged from a second of the plurality of zones. 7. A method as claimed in claim 3 wherein the first radial distance is less than the radius of the holder. 8. A method as claimed in claim 7 wherein the rotating and discharging steps are performed within a reactor vessel having internal wall surfaces in the form of surfaces of revolution coaxial with the axis. 9. A method as claimed in claim 3, further comprising causing the first through third gas streams to mix and establish a mixture having first and second sections, the first section extending from the axis to the first radial distance and having a first concentration of the first gas, and the second section being positioned past the first radial distance and having a second lower concentration of the first gas. 10. A method as claimed in claim 9, wherein the rotating and discharging steps are performed within a reactor vessel having internal wall surfaces, and wherein the second section of the mixture is positioned near the internal wall surfaces of the reactor so that unwanted deposition on the internal wall surfaces is mitigated. 11. A method as claimed in claim 1, wherein the second gas is reactive with the first gas. 12. A method as claimed in claim 11, wherein the rotating step is performed at a speed to impel the first through third gas streams into rotational flow so that the first and second gasses mix and react with one another. 13. A method of treating one or more substrates comprising: (a) rotating a holder carrying the substrates about an axis while maintaining surfaces of the substrates substantially perpendicular to the axis and facing in an upstream direction along the axis; and, during the rotating step,(b) discharging a first gas in the downstream direction toward the substrates as a first gas stream extending across the axis in a first radial direction perpendicular to the axis and as a second gas stream extending perpendicular to the axis in a second radial direction; and(c) simultaneously discharging a second gas reactive with the first gas in the downstream direction toward the substrates as third gas streams disposed around the axis between the first and second gas streams, wherein the rotating step is performed at a speed to impel the first through third gas streams into rotational flow so that the first and second gasses mix and react with one another. 14. A method as claimed in claim 13, wherein the second radial direction is perpendicular to the first radial direction. 15. A method as claimed in claim 13, wherein the third gas streams are discharged from gas field inlets arranged into a plurality of zones, and within each zone the gas field inlets extend parallel to one another. 16. A method as claimed in claim 13, wherein the first and second gas streams extend to a first radial distance from the axis, and the third gas streams extend to a second radial distance from the axis greater than the first radial distance. 17. A method as claimed in claim 16, wherein when the first and second gasses mix, they establish a mixture having first and second sections, the first section extending from the axis to the first radial distance and having a first concentration of the first gas, and the second section being positioned past the first radial distance and having a second lower concentration of the first gas. 18. A method as claimed in claim 17, wherein the rotating and discharging steps are performed within a reactor vessel having internal wall surfaces, and wherein the second section of the mixture is positioned near the internal wall surfaces of the reactor so that unwanted deposition on the internal wall surfaces is mitigated. 19. A method as claimed in claim 13, wherein the third gas streams are discharged from gas field inlets arranged into a plurality of zones, and the method further comprises regulating an amount of the second gas discharged from at least a first of the plurality of zones independently of an amount of the second gas discharged from a second of the plurality of zones.