Hammerhead TCP coil support for high RF power conductor etch systems
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IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C23C-016/00
H01L-021/306
H01J-037/32
출원번호
US-0924477
(2013-06-21)
등록번호
US-9384948
(2016-07-05)
발명자
/ 주소
Long, Maolin
Paterson, Alex
출원인 / 주소
Lam Research Corporation
대리인 / 주소
Martine Penilla Group, LLP
인용정보
피인용 횟수 :
0인용 특허 :
0
초록▼
The chamber, having a ceramic window disposed in a ceiling of the chamber is provided. Included is a ceramic support having a plurality of spokes that extend from a center region to an outer periphery, and each of the spokes include a hammerhead shape that radially expands the ceramic support in a d
The chamber, having a ceramic window disposed in a ceiling of the chamber is provided. Included is a ceramic support having a plurality of spokes that extend from a center region to an outer periphery, and each of the spokes include a hammerhead shape that radially expands the ceramic support in a direction that is away from an axis of a spoke. Also included is a plurality of screw holes disposed through the ceramic support. The plurality of screw holes defined to enable screws to connect to a TCP coil having an inner and outer coil. The outer coil is to be disposed under the hammerhead shape of each of the spokes, and a radial gap is defined between each of the hammerhead shapes. The radial gap defines a non-continuous ring around the outer coil. A plurality of screws are disposed through the screw holes for attaching the TCP coil.
대표청구항▼
1. A plasma processing system including a substrate support, comprising, a chamber for plasma processing a substrate when disposed over the substrate support of the chamber, the chamber having a ceramic window oriented over the substrate support;a transformer coupled plasma (TCP) coil defined by an
1. A plasma processing system including a substrate support, comprising, a chamber for plasma processing a substrate when disposed over the substrate support of the chamber, the chamber having a ceramic window oriented over the substrate support;a transformer coupled plasma (TCP) coil defined by an inner coil and an outer coil, the TCP coil disposed over the ceramic window;a ceramic support disposed over to the TCP coil, the ceramic support includes a plurality of spokes that extend from a center region to an outer periphery, each of the spokes include a hammerhead shape that radially expands the ceramic support in a direction that is away from an axis of a spoke; anda plurality of screws connecting TCP coil to the ceramic support, wherein at least a pair of screws connected to the outer coil are radially offset from each other and one of the pair of screws is disposed in the hammerhead shape;wherein the ceramic support, using the plurality of screws, support the TCP coil over the ceramic window of the chamber. 2. The plasma processing system as recited in claim 1, wherein the ceramic support includes a plurality of screw holes for receiving the plurality of screws, the plurality of screw holes being non-treaded; and wherein each of the plurality of screws includes a non-threaded section and a threaded section, the non-threaded section defined to sit in the non-threaded screw holes and the threaded section defined to thread into a threaded of the TCP coil. 3. The plasma processing system as recited in claim 1, wherein the plurality of spokes are aligned along a support axis and a terminal axis. 4. The plasma processing system as recited in claim 3, further comprising, a first terminal support connected to the ceramic support at a first end of a spoke aligned along the terminal axis; anda second terminal support connected to the ceramic support at a second end of the spoke aligned along the terminal axis. 5. The plasma processing system as recited in claim 4, wherein the first and second terminal supports connect to a first terminal body and a second terminal body, respectively, the first and second terminal bodies being held elevated off of the ceramic support by the first and second terminal supports. 6. The plasma processing system as recited in claim 3, further comprising, a plurality of passages defined along the terminal axis, the passages being sized to enable terminals connected to the TCP coil to pass through and reside without contact maintained by a spacing with the ceramic support. 7. The plasma processing system as recited in claim 1, wherein the ceramic support includes elongated passages under terminals of the TCP coil at opposite outer ends of spokes aligned along the terminal axis. 8. The plasma processing system as recited in claim 1, wherein the radial offset is an angle that extends from a center region of the ceramic support and extends to screw holes defined in the outer periphery of the ceramic support. 9. The plasma processing system as recited in claim 1, wherein on one of the spokes three screws are provided, wherein a first screw is disposed through a first side of the hammerhead shape, a second screw is disposed through a spoke region, and a third screw is disposed through a second side of the hammerhead shape, wherein the first side, the second side and the spoke region define the hammer head shape. 10. The plasma processing system as recited in claim 9, wherein the first screw connects to an inner portion of the outer coil, the second screw connects to a middle portion of the outer coil, and the third screw connects to an outer portion of the outer coil. 11. A device for use in a plasma processing system, comprising, a ceramic support having a plurality of spokes that extend from a center region to an outer periphery, each of the spokes include a hammerhead shape that radially expands the ceramic support in a direction that is away from an axis of a spoke; anda plurality of screw holes disposed through the ceramic support, the plurality of screw holes defined to enable screws to connect to a TCP coil having an inner and outer coil, wherein the outer coil is to be disposed under the hammerhead shape of each of the spokes, wherein a radial gap is defined between each of the hammerhead shapes, the radial gap defining a non-continuous ring around the outer coil. 12. The device of claim 11, wherein at least a pair of screw holes are radially offset from each other and one of the pair of screw holes is disposed in the hammerhead shape. 13. The device of claim 11, further comprising, a plurality of screws, the plurality of screws defined to fit through the screw holes, the screws including a non-threaded section and a threaded section, the non-threaded section configured to reside in the screw holes and the threaded sections configured to thread into the TCP coil. 14. The device of claim 11, wherein the plurality of spokes include four spokes, wherein two spokes are aligned along a support axis and two spokes are aligned along a terminal axis. 15. The device of claim 14, further comprising, a first terminal support connected to the ceramic support at a first end of a spoke aligned along the terminal axis; anda second terminal support connected to the ceramic support at a second end of the spoke aligned along the terminal axis. 16. The ceramic support of claim 14, wherein the first and second terminal supports connect to a first terminal body of the TCP coil and a second terminal body, respectively, the first and second terminal bodies being held elevated off of the ceramic support by the first and second terminal supports. 17. The device of claim 14, further comprising a center ceramic support, the center ceramic support defining a loop that is disposed over the inner coil of the TCP coil when present, the center ceramic support defining a structure form which the spokes extend out from to the hammer head shapes. 18. A chamber, comprising: walls that defines a volume for processing plasma, the chamber having a ceramic window disposed in a ceiling of the chamber;a ceramic support having a plurality of spokes that extend from a center region to an outer periphery, each of the spokes include a hammerhead shape that radially expands the ceramic support in a direction that is away from an axis of a spoke; anda plurality of screw holes disposed through the ceramic support, the plurality of screw holes defined to enable screws to connect to a TCP coil having an inner and outer coil, wherein the outer coil is to be disposed under the hammerhead shape of each of the spokes, wherein a radial gap is defined between each of the hammerhead shapes, the radial gap defining a non-continuous ring around the outer coil; anda plurality of screws disposed through the screw holes for attaching the TCP coil to the ceramic support, the ceramic support disposing the TCP coil over the ceramic window. 19. The chamber of claim 18, wherein at least a pair of screw holes are radially offset from each other and one of the pair of screw holes is disposed in the hammerhead shape. 20. The device of claim 18, wherein the screws include a non-threaded section and a threaded section, the non-threaded section configured to reside in the screw holes and the threaded sections configured to thread into the TCP coil.
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