Chemically amplified resist composition and patterning process
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G03F-007/004
G03F-007/30
G03F-007/039
G03F-007/038
G03F-007/20
G03F-007/32
출원번호
US-0820839
(2015-08-07)
등록번호
US-9411226
(2016-08-09)
우선권정보
JP-2014-166583 (2014-08-19)
발명자
/ 주소
Hatakeyama, Jun
출원인 / 주소
SHIN-ETSU CHEMICAL CO., LTD.
대리인 / 주소
Westerman, Hattori, Daniels & Adrian, LLP
인용정보
피인용 횟수 :
0인용 특허 :
7
초록▼
A chemically amplified resist composition comprising a base polymer, an acid generator, and a specific oxime compound has a high contrast of alkaline dissolution rate before and after exposure and high resolution and forms a pattern of satisfactory profile with minimal roughness and wide focus margi
A chemically amplified resist composition comprising a base polymer, an acid generator, and a specific oxime compound has a high contrast of alkaline dissolution rate before and after exposure and high resolution and forms a pattern of satisfactory profile with minimal roughness and wide focus margin.
대표청구항▼
1. A chemically amplified resist composition comprising a base polymer, an acid generator, and a basic compound having the general formula (1): wherein R1 and R2 each are hydrogen, or a straight, branched or cyclic C1-C30 alkyl, C6-C30 aryl, C7-C30 aralkyl, C2-C30 alkenyl, C2-C10 alkynyl, or C4-C12
1. A chemically amplified resist composition comprising a base polymer, an acid generator, and a basic compound having the general formula (1): wherein R1 and R2 each are hydrogen, or a straight, branched or cyclic C1-C30 alkyl, C6-C30 aryl, C7-C30 aralkyl, C2-C30 alkenyl, C2-C10 alkynyl, or C4-C12 heterocyclic-bearing group, or a combination of such groups, which group may contain a hydroxyl, mercapto, carboxyl, ether, thio ether, ester, sulfonic acid ester, sulfonyl, lactone ring, carbonyl, cyano, nitro, halogen, trifluoromethyl, amide, imide, sulfonamide, carbonate, sulfide, or oxime moiety. 2. The resist composition of claim 1 wherein the basic compound is selected from oxime compounds of the following formulae. 3. The resist composition of claim 1 wherein the base polymer comprises recurring units having the general formula (2): wherein R3 and R5 are each independently hydrogen or methyl, X is a single bond, a C1-C12 linking group having an ester moiety or lactone ring, phenylene group or naphthylene group, Y is a single bond or ester group, and R4 and R6 are each independently an acid labile group, a1 and a2 are numbers in the range: 0≦a1<1.0, 0≦a2<1.0, and 0
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이 특허에 인용된 특허 (7)
Takeshi Kinsho JP; Tsunehiro Nishi JP; Takeru Watanabe JP; Koji Hasegawa JP; Mutsuo Nakashima JP; Jun Hatakeyama JP, Acid-decomposable ester compound suitable for use in resist material.
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