This disclosure provides systems, methods, and apparatus for ion generation. In one aspect, an apparatus includes an anode, a first cathode, a second cathode, and a plurality of cusp magnets. The anode has a first open end and a second open end. The first cathode is associated with the first open en
This disclosure provides systems, methods, and apparatus for ion generation. In one aspect, an apparatus includes an anode, a first cathode, a second cathode, and a plurality of cusp magnets. The anode has a first open end and a second open end. The first cathode is associated with the first open end of the anode. The second cathode is associated with the second open end of the anode. The anode, the first cathode, and the second cathode define a chamber. The second cathode has an open region configured for the passage of ions from the chamber. Each cusp magnet of the plurality of cusp magnets is disposed along a length of the anode.
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1. An apparatus comprising: an anode having a first open end and a second open end; a first cathode associated with the first open end of the anode;a second cathode associated with the second open end of the anode, the anode, the first cathode, and the second cathode defining a chamber, the second c
1. An apparatus comprising: an anode having a first open end and a second open end; a first cathode associated with the first open end of the anode;a second cathode associated with the second open end of the anode, the anode, the first cathode, and the second cathode defining a chamber, the second cathode defining an open region configured for the passage of ions from the chamber; anda plurality of cusp magnets, each cusp magnet of the plurality of cusp magnets being disposed along a length of the anode. 2. The apparatus of claim 1, wherein the plurality of cusp magnets are configured to generate a multi-cusp magnetic field, and wherein the multi-cusp magnetic field is configured to contain a plasma generated in the chamber. 3. The apparatus of claim 2, wherein containment of the plasma reduces contact of the plasma with the anode. 4. The apparatus of claim 1, wherein the plurality of cusp magnets includes about 8, 10, 12, or 14 cusp magnets. 5. The apparatus of claim 1, wherein each cusp magnet of the plurality of cusp magnets includes a neodymium magnet. 6. The apparatus of claim 1, wherein the plurality of cusp magnets is associated with an exterior surface of the anode. 7. The apparatus of claim 1, wherein a length of each cusp magnet of the plurality of cusp magnets is about a length of the anode. 8. The apparatus of claim 1, wherein the anode has a cylindrical cross section, and wherein the anode defines a hollow cylindrical region with the first open end and the second open end. 9. The apparatus of claim 1, wherein the anode, the first cathode, and the second cathode comprise a first metal, wherein surfaces of the anode, the first cathode, and the second cathode defining the chamber have a second metal disposed thereon, and wherein the second metal has a higher secondary electron emission coefficient compared to the first metal. 10. The apparatus of claim 9, wherein the first metal is selected from a group consisting of steel, copper, a copper alloy, aluminum, and an aluminum alloy. 11. The apparatus of claim 9, wherein the second metal is selected from a group consisting of gold and platinum. 12. The apparatus of claim 9, wherein the second metal comprises molybdenum. 13. The apparatus of claim 1, further comprising: a field emitter array disposed on a surface of the first cathode defining the chamber. 14. The apparatus of claim 13, wherein the field emitter array includes carbon nanofiber arrays. 15. The apparatus of claim 13, wherein the field emitter array is configured to increase a plasma density of a plasma generated in the chamber. 16. The apparatus of claim 13, further comprising: a grid positioned proximate the field emitter array, wherein the grid is configured to generate an electric field for electron emission from the field emitter array. 17. The apparatus of claim 1, wherein a length of the anode is greater than a cross-sectional dimension of the anode. 18. The apparatus of claim 17, wherein the length of the anode is about 1.25 to 2 times greater than the cross-sectional dimension of the anode. 19. An apparatus comprising: an anode having a first open end and a second open end, a length of the anode being greater than a cross-sectional dimension of the anode;a first cathode associated with the first open end of the anode;a second cathode associated with the second open end of the anode, the anode, the first cathode, and the second cathode defining a chamber, the second cathode defining an open region configured for the passage of ions from the chamber, the anode, the first cathode, and the second cathode comprising a first metal, surfaces of the anode, the first cathode, and the second cathode defining the chamber having a second metal disposed thereon, the second metal having a higher secondary electron emission coefficient compared to the first metal; anda plurality of cusp magnets, each cusp magnet of the plurality of cusp magnets being disposed along a length of the anode. 20. The apparatus of claim 19, wherein the plurality of cusp magnets are configured to generate a multi-cusp magnetic field, and wherein the multi-cusp magnetic field is configured to contain a plasma generated in the chamber.
Ivanov Vladimir V. (Saratov RUX) Danilov Uriy I. (Saratov RUX) Zakharov Michael V. (Saratov RUX), Low breakdown voltage gas discharge device and methods of manufacture and operation.
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Glavish Hilton F. (Incline Village NV), System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic.
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