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A microcooler includes a substrate with a first and second microchannel and an orifice disposed between, in fluid communication with both. A pair of electrodes is in a vicinity of the orifice. An electrical resistive heating material is in electrical communication with the electrodes and is in therm

A microcooler includes a substrate with a first and second microchannel and an orifice disposed between, in fluid communication with both. A pair of electrodes is in a vicinity of the orifice. An electrical resistive heating material is in electrical communication with the electrodes and is in thermal contact with a fluid in the vicinity of the orifice. A system includes the microcooler and a voltage source to apply a voltage across the electrodes, which induces sufficient heating in the heating material to disassociate something clogging the orifice, without significant damage to the heating material. Some systems include a sensor configured to detect an effect of clogging at the orifice. A processor is configured to receive sensor output from the sensor, and if there is an effect of clogging, then cause the voltage to be applied across the electrodes.

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1. An apparatus comprising: a substrate having disposed therein: a first microchannel;a second microchannel;an orifice disposed between the first microchannel and the second microchannel and in fluid communication with both;a pair of electrodes disposed in a vicinity of the orifice; andan electrical

1. An apparatus comprising: a substrate having disposed therein: a first microchannel;a second microchannel;an orifice disposed between the first microchannel and the second microchannel and in fluid communication with both;a pair of electrodes disposed in a vicinity of the orifice; andan electrical resistive heating material disposed in electrical communication with the pair of electrodes and configured to be in thermal contact with a fluid in the vicinity of the orifice. 2. An apparatus as recited in claim 1, wherein the resistive heating material is configured in a serpentine pattern on the substrate. 3. An apparatus as recited in claim 1, wherein the resistive heating material is an evaporated thin film layer deposited on the substrate. 4. An apparatus as recited in claim 1, wherein the resistive heating material is selected from a group comprising chromium, nickel, Nichrome, titanium/chromium layers, tantalum nitride, and Kanthal. 5. An apparatus as recited in claim 1, further comprising a passivation layer disposed on the resistive heating material, the passivation layer configured to separate the resistive heating material from fluid in the first microchannel and the second microchannel and the orifice. 6. An apparatus as recited in claim 1, wherein: the second microchannel is an expansion chamber; andthe orifice is configured to induce a fluid under pressure in the microchannel to expand into low pressure in the expansion chamber. 7. A system comprising; an apparatus as recited in claim 1; anda voltage source configured to apply a voltage across the pair of electrodes, wherein the voltage is sufficient to induce sufficient heating in the electrical resistive heating material to melt a particle or condensate clogging the orifice without significant damage to the electrical resistive heating material. 8. A system as recited in claim 6, wherein the resistive heating material is configured as a thin film in a serpentine pattern on the substrate. 9. A system as recited in claim 7, wherein a current flowing through the resistive heating material as a result of the voltage is less than about 10−2 amperes. 10. A system as recited in claim 6, wherein the sufficient heating raises temperature in the particle or condensate to a value in a range from about 150 Kelvin to about 300 Kelvin. 11. A system as recited in claim 6, further comprising: at least one sensor configured to detect an effect of clogging at the orifice; anda processor configured to perform at least the steps of: receiving sensor output from the at least one sensor,determining an effect of clogging based on the sensor output, andif it is determined that there is an effect of clogging, then causing the voltage source to apply the voltage across the pair of electrodes. 12. A system as recited in claim 11, wherein the sensor is one or more sensors from a group consisting of a flow meter configured to determine flow rate of fluid in the first microchannel or the second microchannel, and a temperature sensor configured to measure a temperature of a thermal load in thermal contact with the second microchannel. 13. A system as recited in claim 11, wherein: the sensor comprises a thermal load in thermal contact with the second microchannel; anddetermining the effect of clogging comprises determining a change in a statistic of data from the sensor. 14. A method comprising: operating the apparatus of claim 1 to cool a thermal load in thermal contact with the second microchannel;obtaining sensor output from at least one sensor configured to detect an effect of clogging at the orifice;determining an effect of clogging based on the sensor output; andif it is determined that there is an effect of clogging, then causing a voltage source to apply a voltage across the pair of electrodes for a limited time,wherein the voltage for the limited time is sufficient to induce sufficient heating in the electrical resistive material to melt a particle or condensate clogging the orifice without significant damage to the electrical resistive material.