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System for and method of fast pulse gas delivery 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G05D-007/06
출원번호 US-0209216 (2014-03-13)
등록번호 US-10126760 (2018-11-13)
발명자 / 주소
  • Ding, Junhua
  • L'Bassi, Michael
  • Lee, Tseng-Chung
출원인 / 주소
  • MKS Instruments, Inc.
대리인 / 주소
    Hamilton, Brook, Smith & Reynolds, P.C.
인용정보 피인용 횟수 : 0  인용 특허 : 31

초록

A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as seq

대표청구항

1. A programmable mass flow controller comprising: an input configured to receive an input signal;an output configured to provide an output signal;a communication port configured to receive program instructions including instructions relating to the programmed configuration of the mass flow controll

이 특허에 인용된 특허 (31)

  1. Sneh, Ofer, ALD apparatus and method.
  2. Sneh, Ofer, ALD apparatus and method.
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  4. Sneh, Ofer; Seidel, Thomas E.; Galewski, Carl, Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition.
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  7. Todate Shigenori,JPX ; Matsuda Katsuhiko,JPX ; Nakama Kazuhisa,JPX, Control system.
  8. Ding,Junhua; Zarkar,Kaveh; Shajii,Ali; Smith,Daniel, Critical flow based mass flow verifier.
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  11. Mudd Daniel T. (Long Beach CA), Flow controller, parts of flow controller, and related method.
  12. Evans,Martin, Fluid catalytic cracking catalyst injection system and method for communicating with same.
  13. Ashley Ethan (Santa Clara CA), Interhalogen cleaning of process equipment.
  14. Wang Tak K. (Havertown PA) Wikfors Edwin E. (Landenberg PA), Method and apparatus for improved flow and pressure measurement and control.
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  16. Sato Kazuo (Tokyo JPX), Method for supplying metal organic gas and an apparatus for realizing same.
  17. Brown Timothy R., Method for wide range gas flow system with real time flow measurement and correction.
  18. Ohmi, Tadahiro; Kagatsume, Satoshi; Sugiyama, Kazuhiko; Minami, Yukio; Nishino, Kouji; Dohi, Ryousuke; Yonehana, Katsunori; Ikeda, Nobukazu; Yamaji, Michio; Hirose, Jun; Fukazawa, Kazuo; Koizumi, Hir, Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus.
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  20. Hanazaki Minoru,JPX ; Ikushima Takayuki,JPX ; Shirakawa Kenji,JPX ; Yamaguchi Shinji,JPX ; Taki Masakazu,JPX, Plasma processing method and plasma processing apparatus.
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  22. Van Suchtelen Jaap (Hoogeloon NLX) Giling Lodevicus J. (Nijmegen NLX) Hogenkamp Josephus E. M. (Nijmegen NLX), Process for the epitaxial production of semiconductor stock material.
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  24. Clark, William R., Pulsed mass flow delivery system and method.
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  28. Horiuchi Toru,JPX, Self-diagnosis method for mass flow controller.
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  30. Asano Atsushi,JPX ; Miura Yoshikatsu,JPX, System for applying recipe of semiconductor manufacturing apparatus.
  31. Krishnendu Kar ; Robert Semidey, Ultra accurate gas injection system.
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