IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0180853
(2014-02-14)
|
등록번호 |
US-10221482
(2019-03-05)
|
우선권정보 |
DE-10 2013 101 534 (2013-02-15) |
발명자
/ 주소 |
- Krücken, Thomas
- Gopi, Baskar Pagadala
- Dauelsberg, Martin
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
0 인용 특허 :
13 |
초록
▼
A gas distributor for a CVD reactor includes two separate gas distribution chambers, into each of which a process gas can be fed through an infeed opening. Each of the gas distribution chambers is formed, in part, by a gas distribution device disposed in a top layer being in each case flow-connected
A gas distributor for a CVD reactor includes two separate gas distribution chambers, into each of which a process gas can be fed through an infeed opening. Each of the gas distribution chambers is formed, in part, by a gas distribution device disposed in a top layer being in each case flow-connected to connecting channels disposed in a bottom layer. The connecting channels associated with different gas distribution chambers lie alternately adjacent to one another and have gas outlet openings for the process gases to escape. Each of the at least two gas distribution devices has a distribution section, which in each case is flow-connected to a plurality of sub-distribution sections. The connecting channels are flow-connected to at least one of the sub-distribution sections. The sub-distribution sections of different gas distribution chambers lie alternately adjacent to one another and are separated from one another by a dividing wall.
대표청구항
▼
1. A gas distributor for a chemical vapor deposition (CVD) reactor having at least a first and a second gas distribution chamber (10, 20), into each of which a process gas is fed through an infeed opening (2, 3), each of the gas distribution chambers (10, 20) formed in part by a gas distribution dev
1. A gas distributor for a chemical vapor deposition (CVD) reactor having at least a first and a second gas distribution chamber (10, 20), into each of which a process gas is fed through an infeed opening (2, 3), each of the gas distribution chambers (10, 20) formed in part by a gas distribution device disposed in a first layer being in each case flow-connected to connecting channels (13, 23) disposed in a second layer, the first layer being adjacent and parallel to the second layer, the connecting channels (13, 23) having gas outlet openings (14, 24) for the process gases to escape, the gas distributor characterized in that the first gas distribution chamber (10) has a first distribution section (12) located in the first layer, the second gas distribution chamber (20) has a second distribution section (22) located in the first layer, the first distribution section (12) being flow-connected to a first plurality of sub-distribution sections (11), the second distribution section (22) being flow-connected to a second plurality of sub-distribution sections (21), each of the connecting channels (13, 23) being flow-connected to either the first plurality of sub-distribution sections (11) or the second plurality of sub-distribution sections (21), ones of the first plurality of sub-distribution sections (11) and ones of the second plurality of sub-distribution sections (21) lying alternately adjacent to one another and being separated from one another by a dividing wall (9), wherein the connecting channels (13, 23) are formed by inverted U-profile tunnel elements (15, 25),wherein the first plurality of sub-distribution sections (11) and the second plurality of sub-distribution sections (21) are partially located in the first layer and extend into the second layer via spaces between adjacent ones of the inverted U-profile elements (15, 25),wherein each of the inverted U-profile tunnel elements (15, 25) comprises two planar side walls (17, 27) disposed parallel to one another and a planar connecting wall (18, 28) which connects the two planar side walls (17, 27),wherein one edge of each of the planar side walls is connected to an inner surface (4) of a gas outlet plate (8),wherein gas-outlet-plate-facing surfaces of all of the inverted U-profile tunnel elements (25) forming ones of the connecting channels (13) that are flow connected to the first gas distribution chamber (10), and gas-outlet-plate-facing surfaces of all of the inverted U-profile tunnel elements (15) forming ones of the connecting channels (23) that are flow connected to the second gas distribution chamber (20) are located within a single two-dimensional plane, andwherein the inverted U-profile tunnel elements (15, 25) are arranged in the second layer in a checkered pattern resembling a chess board. 2. The gas distributor of claim 1, wherein the first plurality of sub-distribution sections (11) and the second plurality of sub-distribution sections (21) mesh with one another like teeth of a comb. 3. The gas distributor of claim 1, wherein the dividing wall (9) exhibits a meandering profile. 4. The gas distributor of claim 1, wherein the first distribution section (12) is arranged opposite to the second distribution section (22) in the first layer. 5. The gas distributor of claim 1, wherein the dividing wall (9) is disposed adjacent to the planar connecting walls (18, 28) of the inverted U-profile tunnel elements (15, 25), and is disposed in the first layer. 6. The gas distributor of claim 1, wherein the inverted U-profile tunnel elements (25) forming portions of the first gas distribution chamber (10) and the inverted U-profile tunnel elements (15) forming portions of the second gas distribution chamber (20) are located adjacent to one another. 7. The gas distributor of claim 1, wherein the gas outlet openings (14, 24) are disposed in a gas outlet surface (7) of the gas outlet plate (8), and wherein a first row of the gas outlet openings (14) are fed by the first gas distribution chamber (10), a second row of the gas outlet openings (24) adjacent to the first row are fed by the second gas distribution chamber (20), a third row of the gas outlet openings (14) adjacent to the second row are fed by the first gas distribution chamber (10), and a fourth row of the gas outlet openings (24) adjacent to the third row are fed by the second gas distribution chamber (20). 8. The gas distributor of claim 1, wherein the infeed openings (2, 3) are disposed on a surface perpendicular to an extent of the gas outlet plate (8). 9. The gas distributor of claim 1, wherein all of the sub-distribution sections (11) of the first gas distribution chamber (10) are fluidly connected to a single contiguous distribution section (12), and wherein all of the sub-distribution sections (21) of the second gas distribution chamber (20) are fluidly connected to a single contiguous distribution section (22). 10. The gas distributor of claim 1, wherein the first plurality of sub-distribution sections (11) and the second plurality of sub-distribution sections (21) extend linearly along a first direction, wherein the connecting channels (13, 23) extend linearly along a second direction, and wherein the first direction is perpendicular to the second direction.
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