초록 ▼

○ 습식 Cr 도금법을 대체하기 위한 ICP- Thermal Evaporation 공정 기술의 개발
>> Thermal Evaporation 증발조건 확립
- 높은 증착 속도와 피막내의 낮은 잔류응력 구현
>> ICP antenna 디자인
- Matching network 이용
○ ICP- Sputtering을 이용한 플라스틱 기판 위에 장식용 코팅 기술 개발
>> 실시간 공정 모니터링
- 시간에 따른 기판의 온도변화 관찰
>> 데이터베이스 구축
- 피막의 색상，밝기

○ 습식 Cr 도금법을 대체하기 위한 ICP- Thermal Evaporation 공정 기술의 개발
>> Thermal Evaporation 증발조건 확립
- 높은 증착 속도와 피막내의 낮은 잔류응력 구현
>> ICP antenna 디자인
- Matching network 이용
○ ICP- Sputtering을 이용한 플라스틱 기판 위에 장식용 코팅 기술 개발
>> 실시간 공정 모니터링
- 시간에 따른 기판의 온도변화 관찰
>> 데이터베이스 구축
- 피막의 색상，밝기 등 평가
>> 저온 코팅공정 조건 확립
- 저온 코팅을 위한 최적화된 공정 조건 확립
○ ICP- Thermal Evaporation Cr 도금기술 최적화
>> Cr 증발조건의 최적화
- 증발 속도 및 피막 성장 속도 제어
>> 압력변화에 따른 증착조건 확립
- 공정 압력에 따른 피막 및 플라즈마 특성 관찰
○ ICP- Sputtering을 이용한 TiN, $TiO_2$
장식용 코팅 기술 개발
>> 코팅층의 경도，접착력 평가
- TiN 피 막의 경도 및 접착력 평가
>> 코팅층의 표면조도 및 내마모성 평가
- TiN 피막의 표면 거칠기 및 내마모성 분석
>> $TiO_2$ 장식용 코팅을 위한 공정 조건의 확립

Abstract ▼

The development of surface engineering technique in the last quarter century has had a major impact on manufacturing. Todays coated tools enable users to machine a wide range of workpiece materials faster than uncoated tools. Anticorrosion and other protective coatings, also improve the nature of su

The development of surface engineering technique in the last quarter century has had a major impact on manufacturing. Todays coated tools enable users to machine a wide range of workpiece materials faster than uncoated tools. Anticorrosion and other protective coatings, also improve the nature of surface materials to a marked degree. During these production processes, Vacuum and surface technology have significantly contributed to the rapid progress in wear resistant, heat resistant, antifriction, anticorrosion, protective and others. One of the key elements in the impressive development of vacuum and surface technology is increasing use of plasma processes. Plasma can be used as a tool for heating, evaporation, sputtering, etching and ionization as well as an activator for gaseous atoms and molecules.
However, the increasing demands of the industry for the efficiency of surface coatings, especially from the point of view of economically beneficial and environmentally conscious manufacturing, make it necessary, to improve the properties of the coatings by searching new coating materials and by perfecting the coating synthesis process.
The application of vacuum and plasma coatings increases. Thin, adherent hard coatings are still widely used on the cutting tools and protective coatings. Wear-resistant coatings, applied on high-speed steel or cemented carbide tools are greatly enhancing tool lifetime and reducing manufacturing cost. The deposition of wear-resistant coating also offers a way to increase the service life of the die-casting tools. Thermal barrier ceramic coatings are successfully used for applications in vane and blades for engine, aircraft compressor blade, inner wall of hallow objects, and the electricity supply industry system. Automobile industry, with a huge potential for the market, are also gaining great attraction for the surface treatment and coatings.
The need for the development of clean technologies increases. This is initiated by environmental laws and programs of countries around the world. Among the major sources of environmental pollution are technologies and processes used in conventional metal finishing operations such as electroless and electroplating of protective and decorative coatings. The disposal of waste and exhaust, such as
lubricants in aluminum die-casting is also ecologically risky. Dry coating processes also generate wastes such as vacuum pump oil and liquid ring pump water that must be disposed properly. Now, the development of environmentally friendly process became very important issues in wear and protective coatings.
The study of hard coating process using inductively coupled plasma (ICP) was performed in our laboratory previously, and the TiN coating of a very high hardness 7000HKo.01 is produced successfully. High density ICP enable production of materials, such as DLC, CN, MgO and CrN films, which is difficult to produce using previous technologies. Generating ICP is very simple and easy to apply a previous equipment without modifying difficultly. The new deposition process using ICP is very prospective.
o The development of alternative method for electroplating Chromium deposition using ICP-thermal evaporation process
The design of a ICP antenna was developed successfully for generating high density plasma in conventional thermal evaporation process. The shape and position of the antenna was designed considering the geometry of an evaporation source and a substrate. The matching network is designed for generating a plasma efficiently considering the geometry of ICP antenna and chamber and deposition conditions. At 600W rf power, the reflective is maintained less than 5%. The database of the deposition rate as a function of rf power was made by monitoring deposition rate with varying ICP power. As ICP power increased, the deposition rate decreased because of re-sputtering. And the deposition rate was measured at a pressure of 10~60 mTorr. As the pressure increased, the deposition rate decreased owing to scattering of evaporated source material. Films deposited using ICP thermal evaporation, at high ICP power of 400W, had dense texture and low surface roughness. ICP thermal Evaporation can make Cr coatings having good mechanical properties with a high deposition rate.
o The development of decorative coating technology on polymer substrate using ICP sputtering
The variation of substrate temperature was measured during a deposition process, it was found that the plasma heating increased substrate temperature. The color and brightness of hard coatings produced by ICP sputtering method was characterized using CIE L * -a * -b *. At ICP power 300W, gold-color TiN was deposited, and its color and brightness was superior to conventional decorative TiN coating. It was found that the difference of color of coatings depended on types of substrate. There are several factors to influence the color and brightness of the film. Stoichiometry, distortion of lattice, surface roughness and impurities such as oxygen and carbon affect the color and brightness of coatings. Plasma surface cleaning enhanced the adhesion of coatings. Low-temperature coating process was developed using ICP.
o Optimization of Cr coating in ICP-thermal evaporation process
RF matching system enable to generate plasma stably above 600W. Generated plasma(ICP) had a high ion density of ~ $1\times10^{12}$/$cm^3$ applying 600W RF power at 20mTorr. The relation between pressure and deposition rate shows that the deposition rate decreased gradually as inceasing pressure, but the deposition rate didn't varied much by a change of pressure because of the high ion flux generated by ICP. Plasma density was measured using Langmuir probe, the results showed that the optimum pressure for generating high density plasma was in the range of 20~40mTorr. The corrosion property of Cr coatings produced by ICP evaporation system was compared with that of electroplated Cr coatings. It was found that Cr coatings by ICP evaporation had a superior corrosion property. In addition, high density plasma process enable the high rate deposition of abut 1000 A/min without intentional substrate heating. Cr coatings also had low surface roughness( ~20A) and good brightness. Cr coatings with exellent properties was successfully produced at a high ICP power above 400W, which is sufficient to generate high density plasma.
o The development of ICP sputtering technique for TiN, Ti02 coating
The hardness of TiN deposited by ICP-sputterring was measured by Knoop hardness tester and nano indenter. The hardness of the coating had a high
hardness of 6500HKo.01 and 35GPa which was higher value than any other TiN coating reported. The adhesion of TiN coating was analyzed by using Rockwell C indentor. It showed very high adhesion value, HF 1. On the scratch test, coatings showed high value of critical load above 40N. On pin-on-disk wear test coatings showed superior wear-resistance. As ICP-power increased, wear-resistance of coatings incresed. It is thought that their exellent properties resulted from their high hardness and adhesion strength. As ICP-power increased, surface roughness was lowered. Stoicheometric Ti02 film was deposited succesfully using reactive sputtering technique assisted by ICP. When oxygen partial pressure was 0.2 at 20mTorr, the deposition rate was highest. The Ti02 film deposited at 20acC had anatase phase.

목차 Contents

• 제1장 연구개발과제의 개요...17
• 제1절 연구개발의 개요...17
• 제2절 연구개발의 필요성...18
• 제3절 연구개발의 목표 및 내용...20
• 제2장 국내외 기술개발 현황...22
• 제3장 연구개발수행 내용 및 결과...24
• 제1절 습식 Cr 도금법 대체를 위한 ICP-Thermal Evaporation 공정 개발...24
• 제2절 ICP-Sputtering을 통한 장식용 코팅 기술 개발...31
• 제3절 ICP-Thermal Evaporation Cr 도금 기술 최적화...43
• 제4절 ICP-Sputtering을 이용한 TiN, $TiO_2$ 코팅 기술 개발...56
• 제5절 저온 TiN 코팅 공정 확립을 위한 플라즈마 분석...93
• 제6절 시작품 제작 및 평가...98
• 제7절 ICP-Sputtering을 이용한 (Ti,A1)N 박막 증착 기술...105
• 제8절 ICP sputtering으로 제조된 (Ti,Cr)N 박막의 기계적 특성 평가...120
• 제9절 ICP-CVD에 의해 증착된 저온 TiN 박막의 특성...137
• 제10절 ICP 응용 system의 플라즈마 공정 분석...146
• 제11절 ICP 응용 system의 모니터링 및 제어 시스템 설계...154
• 제4장 목표달성도 및 관련분야에의 기여도...165
• 제1절 계획대비 달성도...165
• 제2절 관련분야 기술 발전에의 대외 기여도...170
• 제5장 연구개발결과의 활용계획...174
• 제6장 참고문헌...176