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NTIS 바로가기한국세라믹학회지 = Journal of the Korean Ceramic Society, v.41 no.2 = no.261, 2004년, pp.106 - 110
류현욱 (조선대학교 에너지자원신기술연구소) , 최광표 (조선대학교 에너지자원신기술연구소) , 노효섭 (조선대학교 신소재공학과) , 박용주 (조선대학교 에너지자원신기술연구소) , 박진성 (조선대학교 신소재공학과)
Nickel oxide (NiO) thin films were prepared on Si(100) substrates at room temperature by RF magnetron sputtering using a NiO target. The effects of oxygen flow ratio for the plasma gas on the preferred orientation and surface morphology of the NiO films were investigated. Highly crystalline NiO film...
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Fujii, Eiji, Tomozawa, Atsushi, Fujii, Satoru, Torii, Hideo, Masumi Hattori, Ryoichi Takayama. NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition. Japanese journal of applied physics. Part 2, Letters, vol.32, no.a10, L1448-.
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