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NTIS 바로가기한국표면공학회지 = Journal of the Korean institute of surface engineering, v.55 no.6, 2022년, pp.328 - 341
고은총 (서울과학기술대학교 신소재공학과) , 안지상 (서울과학기술대학교 신소재공학과) , 한정환 (서울과학기술대학교 신소재공학과)
Area selective atomic layer deposition (AS-ALD) is a bottom-up nanopattern fabrication method that can grow the ALD films only on the desired substrate areas without using photolithography and etching processes. Particularly, AS-ALD has attracted great attention in the semiconductor manufacturing pr...
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