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NTIS 바로가기Materials letters, v.311, 2022년, pp.131605 -
Zhong, Xuan (Corresponding authors.) , Wan, Zhixin (Corresponding authors.) , Xi, Bin
Abstract ALD-metallic films are typically deposited with assistant of plasma due to lack of suitable reducing co-reactants. In this work, we propose to use RCpCo(CO)2, a cobalt precursor with cyclopentadienyl (Cp) ligand (R = H) or its trimethylsilylderivative (R = TMS), and tert-Butyl amine ( t Bu...
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