$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Dual active layer a-IGZO TFT via homogeneous conductive layer formation by photochemical H-doping 원문보기

Nanoscale research letters, v.9 no.1, 2014년, pp.619 - 619  

Jeong, Seung-Ki (Department of Materials Science and Engineering, 222 Wangsimni-Ro, Seongdong-Gu, Hanyang University, Seoul 133-791, Republic of Korea) ,  Kim, Myeong-Ho (Department of Materials Science and Engineering, 222 Wangsimni-Ro, Seongdong-Gu, Hanyang University, Seoul 133-791, Republic of Korea) ,  Lee, Sang-Yeon (Department of Materials Science and Engineering and Department of Energy System Research, Ajou University, 206 Worldcup-ro, Yeongtong-Gu, Suwon 443-739, Republic of Korea) ,  Seo, Hyungtak (Department of Materials Science and Engineering and Department of Energy System Research, Ajou University, 206 Worldcup-ro, Yeongtong-Gu, Suwon 443-739, Republic of Korea) ,  Choi, Duck-Kyun (Department of Materials Science and Engineering, 222 Wangsimni-Ro, Seongdong-Gu, Hanyang University, Seoul 133-791, Republic of Korea)

Abstract AI-Helper 아이콘AI-Helper

In this study, InGaZnO (IGZO) thin film transistors (TFTs) with a dual active layer (DAL) structure are fabricated by inserting a homogeneous embedded conductive layer (HECL) in an amorphous IGZO (a-IGZO) channel with the aim of enhancing the electrical characteristics of conventional bottom-gate-st...

주제어

참고문헌 (27)

  1. Bardsley JN International OLED technology roadmap IEEE J Sel Top Quant Electron, IEEE Journal of 2004 10 3 9 10.1109/JSTQE.2004.824077 

  2. Nomura K Ohta H Takagi A Kamiya T Hirano M Hosono H Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors Nature 2004 432 488 492 10.1038/nature03090 15565150 

  3. Yabuta H Sano M Abe K Aiba T Den T Kumomi H Nomura K Kamiya T Hosono H High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering Appl Phys Lett 2006 89 112123-1-112123-3 

  4. Jeong JK Jeong JH Yang HW Park J-S Mo Y-G Kim HD High performance thin film transistors with cosputtered amorphous indium gallium zinc oxide channel Appl Phys Lett 2007 91 113505-1-113505-3 

  5. Park J-S Kim H Kim I-D Overview of electroceramic materials for oxide semiconductor thin film transistors J Electroceram 2014 32 117 140 10.1007/s10832-013-9858-0 

  6. Chiang HQ McFarlane BR Hong D Presley RE Wager JF Processing effects on the stability of amorphous indium gallium zinc oxide thin-film transistors J Non-Cryst Solids 2008 354 2826 2830 10.1016/j.jnoncrysol.2007.10.105 

  7. Suresh A Gollakota P Wellenius P Dhawan A Muth JF Transparent, high mobility InGaZnO thin films deposited by PLD Thin Solid Films 2008 516 1326 1329 10.1016/j.tsf.2007.03.153 

  8. Se IO Godeuni C Hyunsang H Wu L Jae-Hyung J Hydrogenated IGZO thin-film transistors using high-pressure hydrogen annealing IEEE Trans Electron Dev 2013 60 2537 2541 

  9. Kamiya T Nomura K Hosono H Origins of high mobility and low operation voltage of amorphous oxide TFTs: electronic structure, electron transport, defects and doping* J Display Technol 2009 5 468 483 

  10. Zan H-W Yeh C-C Meng H-F Tsai C-C Chen L-H Achieving high field-effect mobility in amorphous indium-gallium-zinc oxide by capping a strong reduction layer Adv Mater 2012 24 3509 3514 10.1002/adma.201200683 22678659 

  11. Hosono H Ionic amorphous oxide semiconductors: Material design, carrier transport, and device application J Non-Cryst Solids 2006 352 851 858 10.1016/j.jnoncrysol.2006.01.073 

  12. Iwasaki T Itagaki N Den T Kumomi H Nomura K Kamiya T Hosono H Combinatorial approach to thin-film transistors using multicomponent semiconductor channels: an application to amorphous oxide semiconductors in In–Ga–Zn–O system Appl Phys Lett 2007 90 242114-1242114-3 

  13. Kim ES Ryu MK Son KS Kim TS Lee K-H Park KB Park JS Maeng WJ Kim HS Seon JB Choi W Lee S Metal-channel-aided oxide thin film transistor Meeting Abstracts 2010 1819 MA2010 02 

  14. Kim MJ Choi D-k Effect of enhanced-mobility current path on the mobility of AOS TFT Microelectron Reliab 2012 52 1346 1349 10.1016/j.microrel.2012.02.012 

  15. Flores F Tejedor C Energy barriers and interface states at heterojunctions J Phys C Solid State Phys 1979 12 731 10.1088/0022-3719/12/4/018 

  16. Mosbacker HL Strzhemechny YM White BD Smith PE Look DC Reynolds DC Litton CW Brillson LJ Role of near-surface states in ohmic-Schottky conversion of Au contacts to ZnO Appl Phys Lett 2005 87 012102-1-012102-3 

  17. Tay YY Li S Sun CQ Chen P Size dependence of Zn 2p3/2 binding energy in nanocrystalline ZnO Appl Phys Lett 2006 88 173118-1-173118-3 

  18. Lim SJ Kim J-M Kim D Lee C Park J-S Kim H The effects of UV exposure on plasma-enhanced atomic layer deposition ZnO thin film transistor Electrochem Solid-State Lett 2010 13 H151 H154 10.1149/1.3322733 

  19. Janotti A Van de Walle CG Hydrogen multicentre bonds Nat Mater 2007 6 44 47 10.1038/nmat1795 17143265 

  20. Nomura K Kamiya T Hosono H Effects of diffusion of hydrogen and oxygen on electrical properties of amorphous oxide semiconductor, In-Ga-Zn-O ECS J Solid State Sci Technol 2013 2 P5 P8 10.1149/2.025310jss 

  21. Bang S Lee S Ko Y Park J Shin S Seo H Jeon H Photocurrent detection of chemically tuned hierarchical ZnO nanostructures grown on seed layers formed by atomic layer deposition Nanoscale Res Lett 2012 7 290 10.1186/1556-276X-7-290 22672780 

  22. Seo H Lucovsky G Fleming LB Ulrich MD Lüning J Koster G Geballe TH Length scales for coherent π-bonding interactions in complex high-k oxide dielectrics and their interfaces Microelectron Eng 2007 84 2298 2301 10.1016/j.mee.2007.04.069 

  23. Schroder DK Semiconductor Material and Device Characterization 2006 Hoboken, New Jersey, United States of America: Wiley-Interscience 

  24. Tsao SW Chang TC Huang SY Chen MC Chen SC Tsai CT Kuo YJ Chen YC Wu WC Hydrogen-induced improvements in electrical characteristics of a-IGZO thin-film transistors Solid State Electron 2010 54 1497 1499 10.1016/j.sse.2010.08.001 

  25. Nomura K Kamiya T Ohta H Ueda K Hirano M Hosono H Carrier transport in transparent oxide semiconductor with intrinsic structural randomness probed using single-crystalline InGaO3(ZnO)5 films Appl Phys Lett 2004 85 1993 1995 10.1063/1.1788897 

  26. Takagi A Nomura K Ohta H Yanagi H Kamiya T Hirano M Hosono H Carrier transport and electronic structure in amorphous oxide semiconductor, a-InGaZnO4 Thin Solid Films 2005 486 38 41 10.1016/j.tsf.2004.11.223 

  27. Park JS Jeong JK Chung HJ Mo YG Kim HD Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water Appl Phys Lett 2008 92 072104-1–072104-3 

LOADING...
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로