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19. 10.1149/1.2209339 Matero, R., Rahtu, A., Haukka, S., Tuominen, M., Vehkamaki, M., et al., “Scale-Up of the BaTiO3 ALD Process onto 200 mm Wafer,” ECS Transactions, Vol. 1, No. 10, pp. 137-141, 2006. 

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23. Menou, N., Popovici, M., Clima, S., Opsomer, K., Polspoel, W., Kaczer, B., Rampelberg, G., Tomida, K., Pawlak, M. A., Detavernier, C., Pierreux, D., Swerts, J., Maes, J. W., Manger, D., Badylevich, M., Afanasiev, V., Conard, T., Favia, P., Bender, H., Brijs, B., Vandervorst, W., Van Elshocht, S., Pourtois, G., Wouters, D. J., Biesemans, S., Kittl, J. A.. Composition influence on the physical and electrical properties of SrxTi1−xOy-based metal-insulator-metal capacitors prepared by atomic layer deposition using TiN bottom electrodes. Journal of applied physics, vol.106, no.9, 094101-.

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24. Lee, Sang Woon, Han, Jeong Hwan, Han, Sora, Lee, Woongkyu, Jang, Jae Hyuck, Seo, Minha, Kim, Seong Keun, Dussarrat, C., Gatineau, J., Min, Yo-Sep, Hwang, Cheol Seong. Atomic Layer Deposition of SrTiO₃ Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors. Chemistry of materials : a publication of the American Chemical Society, vol.23, no.8, 2227-2236.

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25. Lee, Woongkyu, Han, Jeong Hwan, Jeon, Woojin, Yoo, Yeon Woo, Lee, Sang Woon, Kim, Seong Keun, Ko, Chang-Hee, Lansalot-Matras, Clement, Hwang, Cheol Seong. Atomic Layer Deposition of SrTiO₃ Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors. Chemistry of materials : a publication of the American Chemical Society, vol.25, no.6, 953-961.

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26. 10.1109/IEDM.2008.4796852 

    

27. Ahn, Ji-Hoon, Kang, Sang-Won, Kim, Ja-Yong, Kim, Jin-Hyock, Roh, Jae-Sung. Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO[sub 3] Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition. Journal of the Electrochemical Society : JES, vol.155, no.10, G185-.

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28. 10.1149/1.2981615 Ahn, J.-H., Kim, J.-Y., Kim, J.-H., Roh, J.-S., and Kang, S.-W., “Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition,” Electrochemical and Solid-State Letters, Vol. 12, No. 2, pp. 5-8, 2009. 

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29. Langereis, E., Roijmans, R., Roozeboom, F., van de Sanden, M. C. M., Kessels, W. M. M.. Remote Plasma ALD of SrTiO[sub 3] Using Cyclopentadienlyl-Based Ti and Sr Precursors. Journal of the Electrochemical Society : JES, vol.158, no.2, G34-.

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30. Kim, Jinwoo, Kim, Seokhoon, Jeon, Hyeongtag, Cho, M.-H., Chung, K.-B., Bae, Choelhwyi. Characteristics of HfO2 thin films grown by plasma atomic layer deposition. Applied physics letters, vol.87, no.5, 053108-.

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31. Kwon, Oh Seong, Kim, Seong Keun, Cho, Moonju, Hwang, Cheol Seong, Jeong, Jaehack. Chemically Conformal ALD of SrTiO[sub 3] Thin Films Using Conventional Metallorganic Precursors. Journal of the Electrochemical Society : JES, vol.152, no.4, C229-.

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32. Lee, Sang Woon, Kwon, Oh Seong, Hwang, Cheol Seong. Chemically conformal deposition of SrTiO₃ thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H₂O. Microelectronic engineering, vol.80, 158-161.

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33. 10.1149/1.2720763 Kwon, O. S., Lee, S. W., Han, J. H., and Hwang, C. S., “Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr (C11H19O2)2, Ti (Oi-C3H7)4, and H2O,” Journal of The Electrochemical Society, Vol. 154, No. 6, pp. 127-133, 2007. 

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34. Lee, Sang Woon, Han, Jeong Hwan, Kwon, Oh Seong, Hwang, Cheol Seong. Influences of a Crystalline Seed Layer during Atomic Layer Deposition of SrTiO[sub 3] Thin Films Using Ti(O-iPr)[sub 2](thd)[sub 2], Sr(thd)[sub 2], and H[sub 2]O. Journal of the Electrochemical Society : JES, vol.155, no.11, G253-.

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35. Menou, Nicolas, Popovici, Mihaela, Opsomer, Karl, Kaczer, Ben, Pawlak, Malgorzata A., Adelmann, Christoph, Franquet, Alexis, Favia, Paola, Bender, Hugo, Detavernier, Christophe, Elshocht, Sven Van, Wouters, Dirk J., Biesemans, Serge, Kittl, Jorge A.. Seed Layer and Multistack Approaches to Reduce Leakage in SrTiO₃-Based Metal-Insulator-Metal Capacitors Using TiN Bottom Electrode. Japanese journal of applied physics, vol.49, no.4, 04DD01-.

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36. Popovici, Mihaela, Tomida, Kazuyuki, Swerts, Johan, Favia, Paola, Delabie, Annelies, Bender, Hugo, Adelmann, Christoph, Tielens, Hilde, Brijs, Bert, Kaczer, Ben, Pawlak, Malgorzata A., Kim, Min‐Soo, Altimime, Laith, Van Elshocht, Sven, Kittl, Jorge A.. A comparative study of the microstructure-dielectric properties of crystalline SrTiO₃ ALD films obtained via seed layer approach. Physica status solidi. PSS. A, Applications and materials science, vol.208, no.8, 1920-1924.

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