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Negative ion source with hollow cathode discharge plasma 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-027/02
출원번호 US-0215770 (1980-12-12)
발명자 / 주소
  • Hershcovitch, Ady
  • Prelec, Krsto
출원인 / 주소
  • The United States of America as represented by the Department of Energy
인용정보 피인용 횟수 : 27  인용 특허 : 5

초록

A negative ion source of the type where negative ions are formed by bombarding a low-work-function surface with positive ions and neutral particles from a plasma, wherein a highly ionized plasma is injected into an anode space containing the low-work-function surface. The plasma is formed by hollow

대표청구항

1. A negative ion source comprising: (a) an anode having an interior space for containing a plasma, and an opening into said space, said anode being at a first higher electrical potential; (b) converter means within said space for converting positive ions and neutral particles into negative ions

이 특허에 인용된 특허 (5)

  1. McClanahan Edwin D. (Richland WA) Moss Ronald W. (Richland WA), Device for providing high-intensity ion or electron beam.
  2. Mirtich ; Jr. Michael J. (N. Olmsted OH) Sovey James S. (Strongsville OH) Roman Robert F. (Brookpark OH), Hydrogen hollow cathode ion source.
  3. Mourier ; Georges, Ion source using a hollow cathode discharge arrangement and in particular a particle accelerator comprising such a sour.
  4. Huffman Fred N. (Sudbury MA), Method and apparatus for producing negative ions.
  5. Ohkawa Tihiro (La Jolla CA), Method and apparatus for use in approaching thermonuclear temperatures using turbulent thermal insulation.

이 특허를 인용한 특허 (27)

  1. Michael J. Patterson ; Timothy R. Verhey ; George C. Soulas, Design and manufacturing processes of long-life hollow cathode assemblies.
  2. Patterson, Michael J.; Verhey, Timothy R.; Soulas, George C., Design and manufacturing processes of long-life hollow cathode assemblies.
  3. Kaufman Harold R. (401 Spinnaker La. Fort Collins CO 80525) Robinson Raymond S. (2612 Bradbury Ct. Fort Collins CO 80521) Hughes William E. (7845 Heritage Dr. Annandale VA 22003), Electron bombardment ion sources.
  4. Kato Takao,JPX, Fast atom beam source.
  5. Chutjian Ara (La Crescenta CA) Orient Otto J. (Duarte CA) Aladzhadzhyan Samuel H. (Glendale CA), Generation of intense negative ion beams.
  6. Cuomo Jerome J. (Lake Lincolndale NY) Kaufman Harold R. (Fort Collins CO) Rossnagel Stephen M. (White Plains NY), Hollow cathode.
  7. Paul Stephen McLeod, Hollow cathode sputter source.
  8. Helmer John C. (Menlo Park CA) Doniger Kenneth J. (Menlo Park CA), Inverted re-entrant magnetron ion source.
  9. Farley Marvin ; Dudnikov Vadim G. ; Nasser-Ghodsi Mehran, Ion implantation with charge neutralization.
  10. Ling Peiching, Ion implanters for implanting shallow regions with ion dopant compounds containing elements of high solid solubility.
  11. Madocks, John E., Linear anode layer slit ion source.
  12. Kim, Steven; Sohn, Minho, Magnetron negative ion sputter source.
  13. Wei, Ronghua; Johnson, Richard L.; Rincon, Christopher; Miller, Michael A., Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrode.
  14. Leung Ka-Ngo (Hercules CA) Ehlers Kenneth W. (Alamo CA), Negative ion source.
  15. Wei, Ronghua; Rincon, Christopher; Arps, James H., Plasma immersion ion processing for coating of hollow substrates.
  16. Patterson Michael J. ; Verhey Timothy R. R. ; Soulas George C., Process for ignition of gaseous electrical discharge between electrodes of a hollow cathode assembly.
  17. Patterson, Michael J.; Verhey, Timothy R. R.; Soulas, George C., Process for testing a xenon gas feed system of a hollow cathode assembly.
  18. Patterson, Michael J.; Verhey, Timothy R. R.; Soulas, George C., Process for testing compaction of a swaged heater for an anode sub-assembly of a hollow cathode assembly.
  19. Patterson, Michael J.; Verhey, Timothy R. R.; Soulas, George C., Process for thermal imaging scanning of a swaged heater for an anode subassembly of a hollow cathode assembly.
  20. Patterson Michael J. ; Verhey Timothy R. R. ; Soulas George C., Processes for cleaning a cathode tube and assemblies in a hollow cathode assembly.
  21. Wei, Ronghua, Processing tubular surfaces using double glow discharge.
  22. Hershcovitch Ady (Mount Sinai NY), Production of intense negative hydrogen beams with polarized nuclei by selective neutralization of negative ions.
  23. Lejeune Claude (Gif/Yvette FRX) Gilles Jean P. (Pal ai Seau FRX), Source of ions with at least two ionization chambers, in particular for forming chemically reactive ion beams.
  24. Miller, Michael A.; Wei, Ronghua; Hatton, Gregory, Superhydrophobic compositions and coating process for the internal surface of tubular structures.
  25. Miller, Michael A.; Wei, Ronghua; Hatton, Gregory J., Superhydrophobic compositions and coating process for the internal surface of tubular structures.
  26. Miller, Michael A.; Wei, Ronghua; Hatton, Gregory J., Superhydrophobic compositions and coating process for the internal surface of tubular structures.
  27. Leung, Ka-Ngo; Ehlers, Kenneth W.; Hiskes, John R., Three chamber negative ion source.
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