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한국세라믹학회지 = Journal of the Korean Ceramic Society, v.39 no.5 = no.240, 2002년, pp.479 - 483
조성민 (성균관대학교 신소재공학과) , 김용탁 (성균관대학교 신소재공학과) , 서용곤 (전자부품연구원 광부품연구센터) , 윤형도 (전자부품연구원 광부품연구센터) , 임영민 (전자부품연구원 광부품연구센터) , 윤대호 (성균관대학교 신소재공학과)
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Silicon dioxide thick film using silica optical waveguide cladding was fabricated by Plasma Enhanced Chemical Vapor Deposition(PECVD) method, at a low temperature (
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Y. Kuo, 'Plasma Enhanced Chemical Vapor Deposited Sil-icon Nitride as a Gate Dielectric Film for Amorphous Sil-icon Thin Film Transistors,' Vacuum, 51 741-45 (1998)
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A. A. Langford, M. L. Fleet, B. P. Nelson, W. A. Lanford and N. Maley, 'Infrared Absorption Strength and Hydrogen Content of Hydrogenated Amorphous Silicon,' Phys. Rev. B, 45 13367-77 (1992)
C. Tosello, F. Rossi, S. Ronchin, R. Rolli, G. C. Righini, F. Pozzi, S. Pelli, M. Fossi, E. Moser, M. Montagna, M. Fer-rari, C. Duverger, A. Chiappini and C. D. Bernardi, 'Erbium-activated Silica-titania Planar Waveguides on Silica-on-sil-icon Substrates Prepared by RF Sputtering,' J. Non-Cryst. Solids, 284 230-36 (2001)
J. Zhang, Z. Ren, R. Liang, Y. Sui and W. Liu, 'Planar Opti-cal Waveguide Thin Films Grown by Microwave ECR PECVD,' Surface and Coating Technol., 131 116-20 (2000)
S. M. Cho, Y. T. Kim, Y. G. Seo, Y. M. Im and D. H. Yoon, 'Effects of $N_2O/SiH_4$ , Flow Ratio and RF Power on Prop-erties of $SiO_2$ Thick Films Deposited by Plasma Enhanced Chemical Vapor Deposition(in Kor.),' J. Kor. Ceram. Soc., 38 [11] 1037-41 (2001)
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