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NTIS 바로가기한국정밀공학회지 = Journal of the Korean Society for Precision Engineering, v.34 no.5, 2017년, pp.311 - 314
홍순천 ((주)쎄미시스코 연구개발그룹) , 윤석민 ((주)쎄미시스코 연구개발그룹) , 우봉주 ((주)쎄미시스코 연구개발그룹) , 박정재 (한국표준과학연구원 기반표준본부) , 진종한 (한국표준과학연구원 기반표준본부)
To measure the depth of the through silicon vias on 300 mm silicon wafers, a measuring machine was developed. Based on the preceding research in a laboratory environment, the machine was designed and built by modifying the optical probe for reducing the mass, combining a visible optical microscope t...
Kühne, Stéphane, Hierold, Christofer. Wafer-level packaging and direct interconnection technology based on hybrid bonding and through silicon vias. Journal of micromechanics and microengineering.: structures, devices, and systems, vol.21, no.8, 085032-.
Shen, L.C., Chien, C.W., Cheng, H.C., Lin, C.T.. Development of three-dimensional chip stacking technology using a clamped through-silicon via interconnection. Microelectronics reliability, vol.50, no.4, 489-497.
Esashi, Masayoshi. Wafer level packaging of MEMS. Journal of micromechanics and microengineering.: structures, devices, and systems, vol.18, no.7, 073001-.
Olmen, J.V., Huyghebaert, C., Coenen, J., Aelst, J.V., Sleeckx, E., Ammel, A.V., Armini, S., Katti, G., Vaes, J., Dehaene, W., Beyne, E., Travaly, Y.. Integration challenges of copper Through Silicon Via (TSV) metallization for 3D-stacked IC integration. Microelectronic engineering, vol.88, no.5, 745-748.
Jin, Jonghan, Kim, Jae Wan, Kang, Chu-Shik, Kim, Jong-Ahn, Lee, Sunghun. Precision depth measurement of through silicon vias (TSVs) on 3D semiconductor packaging process. Optics express, vol.20, no.5, 5011-.
Jin, Jonghan, Kim, Jae Wan, Kang, Chu-Shik, Kim, Jong-Ahn, Eom, Tae Bong. Thickness and refractive index measurement of a silicon wafer based on an optical comb. Optics express, vol.18, no.17, 18339-.
Maeng, Saerom, Park, Jungjae, O, Byungsung, Jin, Jonghan. Uncertainty improvement of geometrical thickness and refractive index measurement of a silicon wafer using a femtosecond pulse laser. Optics express, vol.20, no.11, 12184-.
Park, J., Jin, J., Wan Kim, J., Kim, J.A.. Measurement of thickness profile and refractive index variation of a silicon wafer using the optical comb of a femtosecond pulse laser. Optics communications, vol.305, 170-174.
Jin, Jonghan, Maeng, Saerom, Park, Jungjae, Kim, Jong-Ahn, Kim, Jae Wan. Fizeau-type interferometric probe to measure geometrical thickness of silicon wafers. Optics express, vol.22, no.19, 23427-.
Park, Jungjae, Bae, Jaeseok, Jin, Jonghan, Kim, Jong-Ahn, Kim, Jae Wan. Vibration-insensitive measurements of the thickness profile of large glass panels. Optics express, vol.23, no.26, 32941-.
Jin, Jonghan. Dimensional metrology using the optical comb of a mode-locked laser. Measurement science & technology, vol.27, no.2, 022001-.
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