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NTIS 바로가기반도체디스플레이기술학회지 = Journal of the semiconductor & display technology, v.21 no.4, 2022년, pp.81 - 85
하주환 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) , 이학지 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) , 박소담 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) , 신석윤 (서울대학교 차세대융합기술연구원 차세대전자재료연구실) , 변창우 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단)
Mist-CVD is known to have advantages of low cost and high productivity method since the precursor solution is misting with an ultrasonic generator and reacted on the substrate under vacuum-free conditions of atmospheric pressure. However, since the deposition distribution is not uniform, various eff...
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Ha, Minh Tan, -Ho Kim, Yong-Jin Kwon, Cheol-Jin Kim, Seong-Min Jeong and Si-Young Bae. "Understanding Thickness Uniformity of Ga 2 O 3 Thin Films Grown by Mist Chemical Vapor Deposition." ECS Journal of Solid State Science and Technology 8.7 (2019): Q3106-Q3212.
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