최소 단어 이상 선택하여야 합니다.
최대 10 단어까지만 선택 가능합니다.
다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기반도체디스플레이기술학회지 = Journal of the semiconductor & display technology, v.21 no.3, 2022년, pp.101 - 104
하주환 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) , 박소담 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) , 이학지 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단) , 신석윤 (서울대학교 차세대융합기술연구원 차세대전자재료연구실) , 변창우 (서울대학교 차세대융합기술연구원 경기도소재부품장비연구사업단)
Mist-CVD is known to have advantages of low cost and high productivity compared to ALD and PECVD methods. It is capable of reacting to the substrate by misting an aqueous solution using ultrasonic waves under vacuum-free conditions of atmospheric pressure. In particular, Ga2O3 is regarded as advance...
Yuichi Oshima, Encarnacion G. Villora and Kiyoshi Shimamura., "Halide vapor phase epitaxy of twin-free α-Ga 2 O 3 on sapphire (0001) substrates." Applied Physics Express 8.5, pp. 055501, 2015.
Wong, Man Hoi, et al., "Current Aperture Vertical β-Ga 2 O 3 MOSFETs Fabricated by N-and Si-Ion Implantation Doping." IEEE Electron Device Letters 40.3, pp. 431-434, 2018.
Kazuaki Akaiwa, Kentaro Kaneko, Kunio Ichio and Shizuo Fujita., "Conductivity control of Sn-doped αGa 2 O 3 thin films grown on sapphire substrates." Japanese Journal of Applied Physics 55.12, pp. 1202BA, 2016.
Jingi Gim, Jongsu Kim and Gwangchul Kim., "Optical Properties of Ga 2 O 3 Single Crystal by Floating Zone Method." Journal of the Semiconductor & Display Technology, Vol. 20, No. 4, pp. 78-82, 2021.
HeeJae Lee, et al., "Effect of Annealing on Ga 2 O 3 /Al 2 O 3 /SiC Devices Fabricated by RF Sputtering," Journal of the Semiconductor & Display Technology, Vol. 21, No. 2, pp. 85-89, 2022.
Minhtan Ha, et al., "Leidenfrost Motion of Water Microdroplets on Surface Substrate: Epitaxy of Gallium Oxide via Mist Chemical Vapor Deposition." Advanced Materials Interfaces, Vol 8, No. 6, pp. 2001895, 2021.
Kyoungho Kim, et al., "Growth of 2-inch α-Ga 2 O 3 epilayers via rear-flow-controlled mist chemical vapor deposition." ECS Journal of Solid State Science and Technology 8.7, pp. Q3165-Q3170, 2019.
Minhtan Ha, et al., "Understanding Thickness Uniformity of Ga 2 O 3 Thin Films Grown by Mist Chemical Vapor Deposition." ECS Journal of Solid State Science and Technology 8.7, pp. Q3106-Q3212, 2019.
Sunyoung Park, et al., "Enhanced thickness uniformity of large-scale α-Ga 2 O 3 epilayers grown by vertical hot-wall mist chemical vapor deposition." Ceramics International, Vol 48, No. 4, pp. 5075-5082, 2021.
*원문 PDF 파일 및 링크정보가 존재하지 않을 경우 KISTI DDS 시스템에서 제공하는 원문복사서비스를 사용할 수 있습니다.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.