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Efficient Determination of Copper Electroplating Chemistry Additives

IEEE transactions on components, packaging, and manufacturing technology, v.4 no.8, 2014년, pp.1380 - 1390  

Ellis, Charles D. (Dept. of Electr. & Comput. Eng., Auburn Univ., Auburn, AL, USA) ,  Hamilton, Michael C. (Dept. of Electr. & Comput. Eng., Auburn Univ., Auburn, AL, USA) ,  Nakamura, James R. (Dept. of Electr. & Comput. Eng., Auburn Univ., Auburn, AL, USA) ,  Wilamowski, Bogdan M. (Dept. of Electr. & Comput. Eng., Auburn Univ., Auburn, AL, USA)

Abstract AI-Helper 아이콘AI-Helper

Determination of copper electroplating additives is critical to ensuring consistent copper plating of conductors and through-silicon-vias used in semiconductor processing and electronics packaging. The present analysis methods require many chemical analysis steps, generate waste, and are not very ac...

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참고문헌 (30)

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